SCHEMBL25822880

SCHEMBL25822880

O=c1ccc2c3c(ccc2o1)NCCC3

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKD1 Q15139 3/20 0.46
ATM Q13315 2/20 0.46
ALDH1A1 P00352 5/20 0.45
LMNA P02545 2/20 0.45
TP53 P04637 1/20 0.45
HTT P42858 1/20 0.45
CDK5 Q00535 1/20 0.45
CDK5R1 Q15078 1/20 0.45
PRKD2 Q9BZL6 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
GRIA1 P42261 1/20 0.44
GRIA2 P42262 1/20 0.44
GRIA3 P42263 1/20 0.44
GRIA4 P48058 1/20 0.44
AR P10275 1/20 0.40
NCOA1 Q15788 1/20 0.39
KDM4E B2RXH2 4/20 0.38
HPGD P15428 4/20 0.38
CASP1 P29466 4/20 0.38
CASP7 P55210 4/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2492859 0.76 GRIA1 (0.45) PRKD1ATMALDH1A1LMNATP53
Hydrochloric Acid SCHEMBL2491847 0.75 GRIA1 (0.44) PRKD1ATMALDH1A1LMNAGRIA1
SCHEMBL4929162 0.71 GRIA1 (0.55) ALDH1A1LMNATP53HTTGRIA1
SCHEMBL14088038 0.68 NCOA1 (0.41) PRKD1ATMALDH1A1LMNATP53
SCHEMBL24176570 0.68 ATM (0.55) ATMALDH1A1LMNATP53AR
SCHEMBL11552058 0.68 ATM (0.58) ATMALDH1A1LMNATP53AR
SCHEMBL3261873 0.67 KDM4E (0.48) PRKD1ATMALDH1A1LMNATP53
SCHEMBL3262044 0.66 KDM4E (0.47) PRKD1ATMALDH1A1LMNATP53
SCHEMBL30206929 0.66 GRIA1 (0.42) PRKD1ATMALDH1A1LMNATP53
SCHEMBL31573923 0.66 MAOA (0.40) ALDH1A1LMNATP53L3MBTL1NCOA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed
US-20230229084-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-20 US disclosed