SCHEMBL24938716

SCHEMBL24938716

N#CCCCN1C=CC=CC1

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.34
ALDH1A1 P00352 1/20 0.31
PKM P14618 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28986348 0.98 MAPT (0.33) MAPTALDH1A1PKM
Bromide SCHEMBL31536069 0.79
Thiocyanic Acid SCHEMBL31570017 0.77 GBA2 (0.31)
Water SCHEMBL27754435 0.76 GBA2 (0.35)
SCHEMBL1509118 0.75 KEAP1 (0.31)
SCHEMBL27920554 0.75
Ammonia Solution, Strong SCHEMBL27805041 0.74 GBA2 (0.34)
SCHEMBL15328974 0.74
SCHEMBL11831406 0.74 SIGMAR1 (0.31)
SCHEMBL10556464 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107004912-B Electrolyte and metal hydride battery 巴斯夫公司 2021-07-30 CN claimed
CN-104143494-B There is the plasma processing chamber component that protective layer is formed in situ in plasma exposure face 朗姆研究公司 2018-08-14 CN claimed
CN-111117594-B Electrochromic material and electrochromic device based on dynamic metal-ligand complexation 吉林大学 2024-03-26 CN disclosed
US-20230022263-A1 N-TYPE DOPANTS FOR PHOTOACTIVE REGIONS OF ORGANIC PHOTOVOLTAICS UNIV KING ABDULLAH SCI & TECH (SA) 2023-01-26 US disclosed
CN-108886175-B Silicon-based solid electrolyte for rechargeable batteries 巴斯夫公司 2022-08-02 CN disclosed
CN-107004912-B Electrolyte and metal hydride battery 巴斯夫公司 2021-07-30 CN disclosed
CN-110415978-A Electrolytic capacitor and the method for manufacturing electrolytic capacitor TOKIN CORP 2019-11-05 CN disclosed
CN-105408775-B Optical film, method for producing optical film, and surface light-emitting body 三菱化学株式会社 2018-01-19 CN disclosed
CN-105408775-A Optical film, method for producing optical film, and surface light-emitting body MITSUBISHI RAYON CO 2016-03-16 CN disclosed
CN-104217915-A CHAMBER WALL OF A PLASMA PROCESSING APPARATUS INCLUDING A FLOWING PROTECTIVE LIQUID LAYER LAM RES CORP 2014-12-17 CN disclosed
CN-104143494-A Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface LAM RES CORP 2014-11-12 CN disclosed