SCHEMBL24943644

SCHEMBL24943644

CCCC/C=C/C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.44
MAPT P10636 1/20 0.41
DRD3 P35462 1/20 0.36
OPRD1 P41143 3/20 0.36
OPRK1 P41145 3/20 0.36
PTGS2 P35354 1/20 0.36
CYP1A2 P05177 2/20 0.34
CYP3A4 P08684 2/20 0.34
CYP2C9 P11712 2/20 0.34
TSHR P16473 2/20 0.34
CYP2C19 P33261 2/20 0.34
HDAC3 O15379 1/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
CYP2D6 P10635 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944291 0.95 OPRM1 (0.43) OPRM1MAPT
SCHEMBL26413343 0.88 OPRM1 (0.48) OPRM1DRD3OPRD1OPRK1
SCHEMBL24944900 0.87 OPRM1 (0.38) OPRM1MAPTDRD3OPRD1OPRK1
SCHEMBL26413348 0.83 OPRM1 (0.43) OPRM1DRD3OPRD1OPRK1CYP1A2
SCHEMBL26478567 0.83 OPRM1 (0.42) OPRM1DRD3OPRD1OPRK1
SCHEMBL26413364 0.81 OPRM1 (0.56) OPRM1MAPTOPRD1OPRK1ALDH1A1
SCHEMBL24944587 0.81 OPRM1 (0.45) OPRM1DRD3OPRD1OPRK1
SCHEMBL24944262 0.81 OPRM1 (0.45) OPRM1DRD3OPRD1OPRK1
SCHEMBL26425942 0.81 DRD3 (0.37) OPRM1DRD3OPRD1OPRK1
SCHEMBL24944231 0.81 SOAT2 (0.46) OPRM1MAPTCYP1A2CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885MAPT 2648/4885DRD3 1945/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.