SCHEMBL24943997

SCHEMBL24943997

COc1ccc(CCCC(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.47
KMT2A Q03164 2/20 0.47
CHRM5 P08912 6/20 0.47
CHRM3 P20309 6/20 0.47
CHRM1 P11229 5/20 0.47
RECQL P46063 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
ALOX5 P09917 2/20 0.46
PLAAT3 P53816 1/20 0.46
PLAAT5 Q96KN8 1/20 0.46
PLAAT2 Q9NWW9 1/20 0.46
PLAAT4 Q9UL19 1/20 0.46
SIGMAR1 Q99720 1/20 0.43
RAB9A P51151 2/20 0.42
NPC1 O15118 1/20 0.42
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
HPGD P15428 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944056 0.90 HDAC1 (0.44) KMT2AALOX5SIGMAR1RAB9ANPC1
SCHEMBL26413846 0.89 TDP1 (0.45) ALDH1A1L3MBTL1ALOX5PLAAT3PLAAT5
SCHEMBL26479094 0.86 TDP1 (0.45) KMT2AALOX5PLAAT3PLAAT5PLAAT2
SCHEMBL24943734 0.86 ALDH1A1 (0.46) ALDH1A1CHRM5CHRM3CHRM1L3MBTL1
SCHEMBL24943760 0.86 MAPT (0.44) ALOX5HPGD
SCHEMBL24943758 0.85 MAPT (0.47) ALOX5HPGD
SCHEMBL26413844 0.84 HPGD (0.41) KMT2ACHRM5CHRM3CHRM1L3MBTL1
SCHEMBL24943994 0.83 NPC1 (0.49) KMT2AL3MBTL1RAB9ANPC1CYP3A4
SCHEMBL24944186 0.82 CYP2D6 (0.42) SIGMAR1CYP2D6HPGD
SCHEMBL26413963 0.82 OPRM1 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885KMT2A 1033/4885CHRM5 3920/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.