SCHEMBL24944233

SCHEMBL24944233

O=C(OC1(c2ccccc2)CCNCC1)C1CC=CC1

nearest known ligand 0.42

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.42
HTR2A P28223 1/20 0.36
AKT2 P31751 1/20 0.35
OPRD1 P41143 3/20 0.35
OPRK1 P41145 3/20 0.35
TACR1 P25103 2/20 0.35
HDAC1 Q13547 1/20 0.34
CYP1A2 P05177 1/20 0.33
CYP2D6 P10635 1/20 0.33
AKR1C1 Q04828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413393 0.91 MIF (0.40) OPRM1HTR2AAKT2OPRD1OPRK1
SCHEMBL24944575 0.88 OPRM1 (0.43) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL24944245 0.86 OPRM1 (0.42) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL24944579 0.86 OPRM1 (0.42) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL24943777 0.84 POLB (0.42) OPRM1HTR2AAKR1C1
SCHEMBL24944270 0.84 OPRM1 (0.41) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL24943675 0.83 OPRM1 (0.40) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL24943668 0.82 OPRM1 (0.39) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL24944132 0.82 OPRM1 (0.39) OPRM1HTR2AAKT2OPRD1OPRK1
SCHEMBL26413912 0.82 OPRM1 (0.39) OPRM1HTR2AOPRD1OPRK1TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885HTR2A 3805/4885AKT2 3912/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.