SCHEMBL24944245

SCHEMBL24944245

O=C(OC1(c2ccccc2)CCNCC1)C1CCCC1

nearest known ligand 0.42

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 5/20 0.42
POLB P06746 2/20 0.40
ELANE P08246 1/20 0.40
HTT P42858 2/20 0.36
HTR2A P28223 1/20 0.36
KMT2A Q03164 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
AKR1C1 Q04828 1/20 0.36
HPGD P15428 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
OPRD1 P41143 3/20 0.35
OPRK1 P41145 3/20 0.35
LMNA P02545 1/20 0.35
TACR1 P25103 1/20 0.35
ATM Q13315 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943777 0.99 POLB (0.42) OPRM1POLBELANEHTTHTR2A
SCHEMBL24944579 0.97 OPRM1 (0.42) OPRM1POLBELANEHTTHTR2A
SCHEMBL24944575 0.94 OPRM1 (0.43) OPRM1ELANEHTR2AKMT2AL3MBTL1
SCHEMBL24943675 0.89 OPRM1 (0.40) OPRM1ELANEHTTHTR2ASMN1; SMN2
SCHEMBL24944132 0.88 OPRM1 (0.39) OPRM1HTR2AOPRD1OPRK1TACR1
SCHEMBL26413912 0.88 OPRM1 (0.39) OPRM1ELANEHTR2AKMT2AOPRD1
SCHEMBL26413577 0.88 OPRM1 (0.42) OPRM1ELANEHTTHTR2ASMN1; SMN2
SCHEMBL24943668 0.88 OPRM1 (0.39) OPRM1ELANEHTR2AOPRD1OPRK1
SCHEMBL24943677 0.87 OPRM1 (0.37) OPRM1HTTHTR2AKMT2ASMN1; SMN2
SCHEMBL24944233 0.86 OPRM1 (0.42) OPRM1HTR2AAKR1C1OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885POLB 154/4885ELANE 3291/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.