Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 6/20 | 0.47 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.42 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.40 |
| ▸ | TACR1 | P25103 | 2/20 | 0.39 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.38 |
| ▸ | HTR2A | P28223 | 1/20 | 0.38 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24944253 | 0.88 | OPRM1 (0.45) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL24944034 | 0.86 | OPRM1 (0.48) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL24944578 | 0.86 | OPRM1 (0.43) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL24944629 | 0.85 | OPRM1 (0.58) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL26478532 | 0.85 | OPRM1 (0.47) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL24944260 | 0.85 | OPRM1 (0.47) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL25475398 | 0.85 | OPRM1 (0.47) | OPRM1OPRD1OPRK1DRD3TACR1 | |
| SCHEMBL24944582 | 0.85 | OPRM1 (0.42) | OPRM1OPRD1OPRK1DRD3 | |
| SCHEMBL26413333 | 0.84 | OPRM1 (0.41) | OPRM1OPRD1OPRK1DRD3 | |
| SCHEMBL24944885 | 0.84 | OPRM1 (0.46) | OPRM1OPRD1OPRK1DRD3TACR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230021453-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | HNRNPU, NSUN2, HNRNPR | OPRM1 775/4885OPRD1 1348/4885OPRK1 1644/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.