SCHEMBL24944629

SCHEMBL24944629

CCC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.58

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 7/20 0.58
OPRD1 P41143 3/20 0.58
OPRK1 P41145 3/20 0.58
DRD3 P35462 3/20 0.54
LMNA P02545 1/20 0.46
TACR1 P25103 2/20 0.39
DRD2 P14416 1/20 0.38
DRD4 P21917 1/20 0.38
HTR2A P28223 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28398971 0.89 OPRM1 (0.65) OPRM1OPRD1OPRK1DRD3LMNA
SCHEMBL24944598 0.88 OPRM1 (0.51) OPRM1OPRD1OPRK1DRD3LMNA
SCHEMBL24944034 0.86 OPRM1 (0.48) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26413217 0.86 OPRM1 (0.49) OPRM1OPRD1OPRK1DRD3DRD2
SCHEMBL26413316 0.86 OPRM1 (0.52) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24944596 0.85 OPRM1 (0.48) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24944260 0.85 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL24944252 0.85 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL25475398 0.85 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD3TACR1
SCHEMBL26478532 0.85 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD3TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885OPRD1 1348/4885OPRK1 1644/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.