SCHEMBL24944870

SCHEMBL24944870

O=C(OC1(c2ccccc2)CCNCC1)c1cc(O)c(O)c(O)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NSD2 O96028 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.45
SERPINE1 P05121 6/20 0.44
TYR P14679 2/20 0.41
OPRM1 P35372 2/20 0.40
PRKD3 O94806 1/20 0.40
PRKCG P05129 1/20 0.40
PRKCB P05771 1/20 0.40
PRKCA P17252 1/20 0.40
PRKCH P24723 1/20 0.40
PRKCI P41743 1/20 0.40
PRKCE Q02156 1/20 0.40
PRKCQ Q04759 1/20 0.40
PRKCZ Q05513 1/20 0.40
PRKCD Q05655 1/20 0.40
PRKD1 Q15139 1/20 0.40
POLB P06746 2/20 0.38
KDM4E B2RXH2 1/20 0.38
LMNA P02545 1/20 0.38
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943665 0.90 OPRM1 (0.39) NSD2L3MBTL1SERPINE1OPRM1
SCHEMBL24944892 0.90 OPRM1 (0.44) NSD2L3MBTL1SERPINE1OPRM1LMNA
SCHEMBL24944621 0.88 ESR1 (0.44) L3MBTL1OPRM1POLBKDM4EGAA
SCHEMBL26478678 0.87 OPRM1 (0.41) OPRM1LMNAGFER
SCHEMBL26413416 0.87 OPRM1 (0.39) OPRM1
SCHEMBL24944319 0.87 OPRM1 (0.44) OPRM1
SCHEMBL24943664 0.86 OPRM1 (0.46) OPRM1LMNAGAATDP1
SCHEMBL24944091 0.84 OPRM1 (0.46) OPRM1
SCHEMBL26478677 0.84 OPRM1 (0.43) OPRM1GAA
SCHEMBL26413410 0.84 TACR1 (0.45) OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR NSD2 884/4885L3MBTL1 2012/4885SERPINE1 4718/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.