SCHEMBL24944892

SCHEMBL24944892

Cc1c(O)cc(C(=O)OC2(c3ccccc3)CCNCC2)cc1O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 4/20 0.44
TACR1 P25103 2/20 0.36
NSD2 O96028 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
HDAC1 Q13547 1/20 0.34
LMNA P02545 1/20 0.34
HPGD P15428 1/20 0.34
CNR2 P34972 1/20 0.34
DRD3 P35462 1/20 0.34
SERPINE1 P05121 1/20 0.33
GABRD O14764 1/20 0.33
GABRA1 P14867 1/20 0.33
GABRB1 P18505 1/20 0.33
GABRA5 P31644 1/20 0.33
GABRA3 P34903 1/20 0.33
GABRA2 P47869 1/20 0.33
GABRB2 P47870 1/20 0.33
GABRA4 P48169 1/20 0.33
OPRD1 P41143 2/20 0.33
OPRK1 P41145 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944870 0.90 NSD2 (0.47) OPRM1NSD2L3MBTL1LMNASERPINE1
SCHEMBL24943665 0.87 OPRM1 (0.39) OPRM1TACR1NSD2L3MBTL1HDAC1
SCHEMBL24944319 0.87 OPRM1 (0.44) OPRM1TACR1HDAC1DRD3GABRD
SCHEMBL24944091 0.87 OPRM1 (0.46) OPRM1TACR1HDAC1DRD3GABRD
SCHEMBL24944621 0.86 ESR1 (0.44) OPRM1L3MBTL1HDAC1
SCHEMBL24943664 0.83 OPRM1 (0.46) OPRM1TACR1HDAC1LMNADRD3
SCHEMBL24944860 0.83 OPRM1 (0.47) OPRM1TACR1L3MBTL1HDAC1DRD3
SCHEMBL26413536 0.82 OPRM1 (0.40) OPRM1L3MBTL1LMNAHPGD
SCHEMBL24944097 0.82 OPRM1 (0.44) OPRM1TACR1GABRDGABRA1GABRB1
SCHEMBL24944850 0.82 TACR1 (0.47) OPRM1TACR1HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885TACR1 2183/4885NSD2 884/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.