SCHEMBL24944895

SCHEMBL24944895

CCCCCCCCc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.48

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
RARB P10826 5/20 0.45
MEN1 O00255 1/20 0.45
ALDH1A1 P00352 1/20 0.45
RARA P10276 1/20 0.45
MAPT P10636 1/20 0.45
MTOR P42345 1/20 0.45
KMT2A Q03164 1/20 0.45
ATG4B Q9Y4P1 10/20 0.43
PLA2G1B P04054 8/20 0.43
BCHE P06276 1/20 0.43
THRA P10827 1/20 0.43
THRB P10828 1/20 0.43
CYP1A2 P05177 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
RECQL P46063 1/20 0.43
HAO1 Q9UJM8 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944877 0.99 RARB (0.44) RARBMEN1ALDH1A1RARAMAPT
SCHEMBL24943772 0.97 RARB (0.51) RARBMEN1ALDH1A1RARAMAPT
SCHEMBL24943770 0.97 RARB (0.51) RARBMEN1ALDH1A1RARAMAPT
SCHEMBL24944123 0.95 TRPV1 (0.44) RARBMEN1ALDH1A1RARAMAPT
SCHEMBL24944674 0.91 OPRM1 (0.45) MEN1KMT2ATHRBCYP1A2
SCHEMBL24944044 0.87 OPRM1 (0.48) MEN1ALDH1A1KMT2ACYP1A2
SCHEMBL24943747 0.85 ALDH1A1 (0.47) RARBMEN1ALDH1A1RARAMAPT
SCHEMBL26478940 0.84 OPRM1 (0.40) MEN1KMT2ACYP1A2TDP1
SCHEMBL24943775 0.83 PLA2G4B (0.49) MEN1KMT2A
SCHEMBL24943659 0.82 OPRM1 (0.42) MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR RARB 3187/4885MEN1 3578/4885ALDH1A1 4767/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.