SCHEMBL24948264

SCHEMBL24948264

C=Cc1ccccc1C(=O)OC1(CC(C)=O)CCCC1

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.34
ALDH1A1 P00352 5/20 0.34
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
POLB P06746 2/20 0.34
KDM4E B2RXH2 1/20 0.33
SCN1A P35498 2/20 0.31
SCN2A Q99250 2/20 0.31
SCN3A Q9NY46 2/20 0.31
BACE1 P56817 1/20 0.31
TSHR P16473 2/20 0.31
CTSL P07711 2/20 0.31
CTSB P07858 2/20 0.31
CTSK P43235 2/20 0.31
HSD17B10 Q99714 1/20 0.31
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1902158 0.87 CYP3A4 (0.36) CYP3A4ALDH1A1MEN1KMT2APOLB
SCHEMBL1900001 0.86 ALDH1A1 (0.36) CYP3A4ALDH1A1MEN1KMT2APOLB
SCHEMBL1898213 0.80 SCN1A (0.45) CYP3A4ALDH1A1MEN1KMT2APOLB
SCHEMBL1897426 0.79 SCN1A (0.44) CYP3A4ALDH1A1MEN1KMT2APOLB
SCHEMBL24305907 0.76 NPC1 (0.35) CYP3A4ALDH1A1KMT2APOLBKDM4E
SCHEMBL24950179 0.74 ALDH1A1 (0.34) CYP3A4ALDH1A1KMT2AKDM4ETSHR
SCHEMBL24305895 0.71 CA12 (0.37) ALDH1A1KDM4EBACE1CTSB
SCHEMBL6400218 0.70 TSHR (0.46) CYP3A4ALDH1A1MEN1KMT2APOLB
SCHEMBL24349736 0.70 KDM4E (0.33) ALDH1A1MEN1KMT2APOLBKDM4E
SCHEMBL14106663 0.69 MEN1 (0.32) ALDH1A1MEN1KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023008347-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed
WO-2023008346-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2023-02-02 WO disclosed