SCHEMBL2497906

SCHEMBL2497906

CN(C)c1ccc(C=Cc2nc3ccccc3[nH]2)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 10/20 0.71
▸ TP53 P04637 1/20 0.71
▸ RAB9A P51151 11/20 0.69
▸ MEN1 O00255 9/20 0.69
▸ KMT2A Q03164 9/20 0.69
▸ NPC1 O15118 9/20 0.69
▸ ALDH1A1 P00352 8/20 0.69
▸ KDM4E B2RXH2 8/20 0.69
▸ SMN1; SMN2 Q16637 7/20 0.69
▸ HPGD P15428 5/20 0.69
▸ PKM P14618 3/20 0.69
▸ HSP90AA1 P07900 1/20 0.69
▸ APP P05067 2/20 0.67
▸ KLF5 Q13887 1/20 0.67
▸ LMNA P02545 4/20 0.67
▸ GAA P10253 4/20 0.67
▸ GLA P06280 2/20 0.67
▸ TRPV1 Q8NER1 1/20 0.55
▸ ATP4A P20648 1/20 0.54
▸ ATP4B P51164 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2497904 1.00 MAPT (0.71) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL31252953 1.00 MAPT (0.71) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL15624226 0.88 NPC1 (0.73) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL31305038 0.87 NPC1 (0.89) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL31252955 0.85 MAPT (0.66) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL1298605 0.85 MAPT (0.66) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL1298603 0.85 MAPT (0.66) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL29660212 0.82 NPC1 (1.00) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL537905 0.82 NPC1 (1.00) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL537904 0.82 NPC1 (1.00) MAPTTP53RAB9AMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020162630-A1 METHOD FOR PRODUCING ORGANIC COMPOUND ダイキン工業株式会社 2020-08-13 — — WO disclosed
US-8575288-B2 Photocurable resin composition for forming overcoats RGB pixels black matrixes or spacers in color filter production, and color filters DAI NIPPON PRINTING CO., LTD. (JP) 2013-11-05 — — US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 — — US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 — — US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 — — US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 — — US disclosed
US-7550556-B1 Highly stable resin, hardenable resin composition, production method therefor, color filter and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-06-23 — — US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 — — US disclosed
US-7399574-B2 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2008-07-15 — — US disclosed
EP-1076070-B1 Highly stable resin, hardenable resin composition, production method therefor, color filter and liquid crystal panel DAINIPPON PRINTING CO LTD (JP) 2007-04-04 — — EP disclosed
EP-1141063-B1 HIGH PHOTO-SENSITIVITY CURABLE RESIN, PHOTO-CURABLE RESIN COMPOSITION, PRODUCTION METHOD THEREOF, COLOR FILTER AND LIQUID CRYSTAL DISPLAY PANEL DAINIPPON PRINTING CO LTD (JP) 2006-12-13 — — EP disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 — — US disclosed
US-20030118922-A1 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2003-06-26 — — US disclosed
US-6582862-B1 Curable resin comprising polymer having main chain comprising constitutional unit having acid group and one having hydroxyl group, wherein isocyanate compound containing radical polymerizable group is bonded with acid and/or hydroxy groups DAI NIPPON PRINTING CO., LTD. (JP) 2003-06-24 — — US disclosed
EP-1141063-A1 HIGH PHOTO-SENSITIVITY CURABLE RESIN, PHOTO-CURABLE RESIN COMPOSITION, PRODUCTION METHOD THEREOF, COLOR FILTER AND LIQUID CRYSTAL DISPLAY PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2001-10-10 — — EP disclosed
WO-2001027182-A1 HIGH PHOTO-SENSITIVITY CURABLE RESIN, PHOTO-CURABLE RESIN COMPOSITION, PRODUCTION METHOD THEREOF, COLOR FILTER AND LIQUID CRYSTAL DISPLAY PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2001-04-19 — — WO disclosed
EP-1076070-A2 Highly stable resin, hardenable resin composition, production method therefor, color filter and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2001-02-14 — — EP disclosed
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