SCHEMBL2497904

SCHEMBL2497904

CN(C)c1ccc(/C=C/c2nc3ccccc3[nH]2)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 10/20 0.71
▸ TP53 P04637 1/20 0.71
▸ RAB9A P51151 11/20 0.69
▸ MEN1 O00255 9/20 0.69
▸ KMT2A Q03164 9/20 0.69
▸ NPC1 O15118 9/20 0.69
▸ ALDH1A1 P00352 8/20 0.69
▸ KDM4E B2RXH2 8/20 0.69
▸ SMN1; SMN2 Q16637 7/20 0.69
▸ HPGD P15428 5/20 0.69
▸ PKM P14618 3/20 0.69
▸ HSP90AA1 P07900 1/20 0.69
▸ APP P05067 2/20 0.67
▸ KLF5 Q13887 1/20 0.67
▸ LMNA P02545 4/20 0.67
▸ GAA P10253 4/20 0.67
▸ GLA P06280 2/20 0.67
▸ TRPV1 Q8NER1 1/20 0.55
▸ ATP4A P20648 1/20 0.54
▸ ATP4B P51164 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2497906 1.00 MAPT (0.71) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL31252953 1.00 MAPT (0.71) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL15624226 0.88 NPC1 (0.73) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL31305038 0.87 NPC1 (0.89) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL31252955 0.85 MAPT (0.66) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL1298605 0.85 MAPT (0.66) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL1298603 0.85 MAPT (0.66) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL29660212 0.82 NPC1 (1.00) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL537905 0.82 NPC1 (1.00) MAPTTP53RAB9AMEN1KMT2A
SCHEMBL537904 0.82 NPC1 (1.00) MAPTTP53RAB9AMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020162630-A1 METHOD FOR PRODUCING ORGANIC COMPOUND ダイキン工業株式会社 2020-08-13 — — WO disclosed
US-9932300-B2 N,N′-diarylurea compounds and N,N′-diarylthiourea compounds as inhibitors of translation initiation PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2018-04-03 — — US disclosed
US-20160318857-A1 N,N'-Diarylurea Compounds and N,N'-Diarylthiourea Compounds as Inhibitors of Translation Initiation PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2016-11-03 — — US disclosed
US-9421211-B2 N,N′-diarylurea compounds and N,N′-diarylthiourea compounds as inhibitors of translation initiation PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2016-08-23 — — US disclosed
US-8575288-B2 Photocurable resin composition for forming overcoats RGB pixels black matrixes or spacers in color filter production, and color filters DAI NIPPON PRINTING CO., LTD. (JP) 2013-11-05 — — US disclosed
US-20120115915-A1 N,N'-DIARYLUREA COMPOUNDS AND N,N'-DIARYLTHIOUREA COMPOUNDS AS INHIBITORS OF TRANSLATION INITIATION PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2012-05-10 — — US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 — — US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 — — US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 — — US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 — — US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 — — US disclosed
US-7399574-B2 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2008-07-15 — — US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 — — US disclosed
US-20030118922-A1 Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2003-06-26 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160318857-A1 N,N'-Diarylurea Compounds and N,N'-Diarylthiourea Compounds as Inhibitors of Translation Initiation NSUN2, EIF2AK2, RNGTT MAPT 1631/4885TP53 1092/4885RAB9A 2490/4885
US-20120115915-A1 N,N'-DIARYLUREA COMPOUNDS AND N,N'-DIARYLTHIOUREA COMPOUNDS AS INHIBITORS OF TRANSLATION INITIATION NSUN2, EIF2AK2, RNGTT MAPT 1631/4885TP53 1092/4885RAB9A 2490/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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