SCHEMBL2498524

SCHEMBL2498524

CCCN(CCC)c1ccc(C(=O)c2ccc(N(CCC)CCC)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
EGFR P00533 3/20 0.57
ERBB2 P04626 3/20 0.57
ALDH1A1 P00352 5/20 0.54
HPGD P15428 4/20 0.54
MAPT P10636 2/20 0.54
ESRRG P62508 2/20 0.51
RAB9A P51151 2/20 0.47
NPC1 O15118 1/20 0.47
HCAR3 P49019 2/20 0.46
CNR2 P34972 1/20 0.44
LMNA P02545 1/20 0.43
NPSR1 Q6W5P4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
MEN1 O00255 1/20 0.42
POLB P06746 1/20 0.42
GAA P10253 1/20 0.42
KMT2A Q03164 1/20 0.42
MCL1 Q07820 1/20 0.42
NOX1 Q9Y5S8 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9640979 0.93 EGFR (0.51) EGFRERBB2ALDH1A1HPGDMAPT
SCHEMBL2742810 0.93 HPGD (0.59) EGFRERBB2ALDH1A1HPGDMAPT
SCHEMBL24404041 0.93 ESRRG (0.61) EGFRERBB2ALDH1A1HPGDMAPT
SCHEMBL29138332 0.92 ESRRG (0.54) EGFRERBB2ALDH1A1HPGDMAPT
SCHEMBL23762214 0.91 EGFR (0.54) EGFRERBB2ALDH1A1HPGDMAPT
SCHEMBL27412476 0.90 ESRRG (0.52) EGFRERBB2ALDH1A1HPGDMAPT
SCHEMBL1827424 0.88 EGFR (0.59) EGFRERBB2ALDH1A1HPGDMAPT
SCHEMBL10690897 0.88 EGFR (0.57) EGFRERBB2MAPTESRRGRAB9A
SCHEMBL10083911 0.87 HPGD (0.53) EGFRERBB2ALDH1A1HPGDESRRG
SCHEMBL29138375 0.86 EGFR (0.54) EGFRERBB2ALDH1A1HPGDMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040054244-A1 Process of quadricyclane production EXCITON, INC. 2004-03-18 US claimed
US-5069999-A PRESENSITIZED FUJI PHOTO FILM CO., LTD. (JP) 1991-12-03 US claimed
CN-117164469-A Preparation method of milone derivative 杭华油墨股份有限公司 2023-12-05 CN disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7776507-B2 Photosensitive paste and manufacturing method of member for display panel TORAY INDUSTRIES, INC. (JP) 2010-08-17 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 US disclosed
US-20090035452-A1 Photosensitive paste and manufacturing method of member for display panel TORAY INDUSTRIES, INC. (JP) 2009-02-05 US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 US disclosed
US-20040054244-A1 Process of quadricyclane production EXCITON, INC. 2004-03-18 US disclosed
US-20040031675-A1 Process of quadricyclane production EXCITON, INC. 2004-02-19 US disclosed
US-6635152-B1 Process of driving a non-polymerization solution-phase photochemical transformation EXCITON, INC. 2003-10-21 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
US-5576138-A MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 1996-11-19 US disclosed
US-5478692-A Fine patterning for electronics TOKYO OHKA KOGYO CO., LTD. (JP) 1995-12-26 US disclosed
US-5069999-A PRESENSITIZED FUJI PHOTO FILM CO., LTD. (JP) 1991-12-03 US disclosed