Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 12/20 | 0.46 |
| ▸ | CA2 | P00918 | 12/20 | 0.46 |
| ▸ | MMP1 | P03956 | 6/20 | 0.46 |
| ▸ | MMP2 | P08253 | 6/20 | 0.46 |
| ▸ | MMP9 | P14780 | 6/20 | 0.46 |
| ▸ | MMP8 | P22894 | 6/20 | 0.46 |
| ▸ | MMP13 | P45452 | 6/20 | 0.46 |
| ▸ | F2 | P00734 | 2/20 | 0.32 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.32 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.32 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10076880 | 0.79 | CA1 (0.42) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL24989300 | 0.79 | CA1 (0.42) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL27934623 | 0.75 | CA2 (0.50) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1618620 | 0.74 | CA2 (0.48) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL27445681 | 0.73 | HDAC3 (0.36) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL13672739 | 0.73 | MEN1 (0.36) | CA1CA2MEN1KMT2AATM | |
| SCHEMBL13656081 | 0.72 | CA2 (0.57) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1618706 | 0.72 | CA2 (0.47) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1618140 | 0.72 | CA1 (0.47) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL27241389 | 0.72 | CA2 (0.47) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230045441-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2023-02-09 | — | — | US | disclosed |