SCHEMBL2499387

SCHEMBL2499387

CO[Si](CCCNC=CN)(OC)OC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17111183 1.00 LMNA (0.32) LMNA
SCHEMBL1079699 0.87 LMNA (0.35) LMNA
SCHEMBL11044664 0.82 LMNA (0.32) LMNA
Hydrochloric Acid SCHEMBL11045123 0.80 LMNA (0.32) LMNA
SCHEMBL17763499 0.77 LMNA (0.34) LMNA
SCHEMBL555422 0.75 ADH1B (0.48) LMNA
SCHEMBL7038114 0.75 LMNA (0.33) LMNA
SCHEMBL2384149 0.73 KDM1A (0.36) LMNA
SCHEMBL28957394 0.72 LMNA (0.32) LMNA
SCHEMBL11042699 0.72 CYP2C19 (0.37) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109671941-B Silicon-carbon negative electrode material and preparation method thereof 桑顿新能源科技(长沙)有限公司 2021-09-17 CN claimed
CN-112635734-B Preparation method and application of carbon-coated silica material loaded by carbon nano tube 惠州亿纬锂能股份有限公司 2022-04-12 CN disclosed
CN-109671941-B Silicon-carbon negative electrode material and preparation method thereof 桑顿新能源科技(长沙)有限公司 2021-09-17 CN disclosed
CN-109671941-B Silicon-carbon negative electrode material and preparation method thereof 桑顿新能源科技(长沙)有限公司 2021-09-17 CN disclosed
CN-112635734-A Preparation method and application of carbon-coated silica material loaded by carbon nano tube 惠州亿纬锂能股份有限公司 2021-04-09 CN disclosed
CN-110729456-A Electrode pole piece, and preparation method and application thereof 中国科学院过程工程研究所 2020-01-24 CN disclosed
US-8030100-B2 Chemical sensor SONY DEUTSCHLAND GMBH (DE) 2011-10-04 US disclosed
US-20090227059-A1 CHEMICAL SENSOR MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG... (DE) 2009-09-10 US disclosed
US-7531136-B2 Chemical sensor SONY DEUTSCHLAND GMBH (DE) 2009-05-12 US disclosed
US-20090084162-A1 CHEMICAL SENSOR SONY INTERNATIONAL (EUROPE) GMBH (DE) 2009-04-02 US disclosed