SCHEMBL25012001

SCHEMBL25012001

Nc1ccc(-c2ccc3ccc4c(-c5ccc(N)cc5)ccc5ccc2c3c54)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.43
TDP1 Q9NUW8 3/20 0.43
ALDH1A1 P00352 2/20 0.43
TP53 P04637 2/20 0.43
PRKCZ Q05513 2/20 0.40
HSD17B10 Q99714 2/20 0.37
TAAR1 Q96RJ0 1/20 0.37
NCOA1 Q15788 1/20 0.37
NCOA3 Q9Y6Q9 1/20 0.37
FLT3 P36888 3/20 0.37
CHEK1 O14757 1/20 0.37
DAPK3 O43293 1/20 0.37
JAK2 O60674 1/20 0.37
ABL1 P00519 1/20 0.37
NTRK1 P04629 1/20 0.37
RET P07949 1/20 0.37
MET P08581 1/20 0.37
PIM1 P11309 1/20 0.37
MAP2K2 P36507 1/20 0.37
MAPK8 P45983 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29601161 1.00 CYP3A4 (0.43) CYP3A4TDP1ALDH1A1TP53PRKCZ
SCHEMBL12128615 0.92 HSD17B10 (0.52) CYP3A4TDP1ALDH1A1TP53PRKCZ
SCHEMBL9561191 0.92 ALDH1A1 (0.44) CYP3A4TDP1ALDH1A1TP53PRKCZ
SCHEMBL30034553 0.92 ALDH1A1 (0.44) CYP3A4TDP1ALDH1A1TP53PRKCZ
SCHEMBL13389171 0.84 FLT3 (0.38) CYP3A4TDP1ALDH1A1TP53PRKCZ
SCHEMBL12128612 0.82 PRKCZ (0.46) CYP3A4TDP1ALDH1A1TP53PRKCZ
SCHEMBL30466695 0.80 ALDH1A1 (0.38) CYP3A4TDP1ALDH1A1PRKCZHSD17B10
SCHEMBL2122937 0.79 ALDH1A1 (0.52) CYP3A4TDP1ALDH1A1HSD17B10MEN1
SCHEMBL29547734 0.79 ALDH1A1 (0.52) CYP3A4TDP1ALDH1A1HSD17B10MEN1
SCHEMBL29512003 0.79 ALDH1A1 (0.52) CYP3A4TDP1ALDH1A1HSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 WO disclosed