Methoxymethane

Methoxymethane

SCHEMBL2501432

CC(=O)OCCOC(C)=O.COC

nearest known ligand 0.62

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.62
TSHR P16473 2/20 0.62
CHRM5 P08912 2/20 0.55
CHRM1 P11229 2/20 0.55
CHRM3 P20309 2/20 0.55
PGR P06401 1/20 0.55
CHRM2 P08172 1/20 0.55
CHRM4 P08173 1/20 0.55
HTR1A P08908 1/20 0.55
CHRNB2 P17787 1/20 0.55
TBXA2R P21731 1/20 0.55
CHRNB4 P30926 1/20 0.55
CHRNA3 P32297 1/20 0.55
CHRNA7 P36544 1/20 0.55
CHRNA4 P43681 1/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
CHRNA10 Q9GZZ6 1/20 0.55
CHRNA9 Q9UGM1 1/20 0.55
LMNA P02545 2/20 0.53
HSD17B10 Q99714 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64593 0.93 ALDH1A1 (0.68) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ethylene Glycol SCHEMBL774950 0.91 ALDH1A1 (0.54) ALDH1A1TSHRCHRM5CHRM1CHRM3
Acetic Acid Methyl Ester SCHEMBL16593614 0.90 ALDH1A1 (0.62) ALDH1A1TSHRCHRM5CHRM1CHRM3
Hydrochloric Acid SCHEMBL26134181 0.90 ALDH1A1 (0.65) ALDH1A1TSHRCHRM5CHRM1CHRM3
Ammonia Solution, Strong SCHEMBL5679172 0.90 ALDH1A1 (0.65) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL29446779 0.90 ALDH1A1 (0.65) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL11060536 0.88 ALDH1A1 (0.56) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL24200 0.88
SCHEMBL28307391 0.88 ALDH1A1 (0.56) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL4002515 0.88 ALDH1A1 (0.56) ALDH1A1TSHRCHRM5CHRM1CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160237289-A1 COMPOSITION OF COATING SOLUTION AND DYE SOLVENT USED IN INFORMATION RECORDING MEDIA WANG FU-SHING (TW) 2016-08-18 US claimed
US-20160237289-A1 COMPOSITION OF COATING SOLUTION AND DYE SOLVENT USED IN INFORMATION RECORDING MEDIA WANG FU-SHING (TW) 2016-08-18 US disclosed
US-8466229-B2 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD. (JP) 2013-06-18 US disclosed
US-8253251-B2 Method for producing low-k film, semiconductor device, and method for manufacturing the same ELPIDA MEMORY, INC. (JP) 2012-08-28 US disclosed
US-8030221-B2 Method for producing low-k l film, semiconductor device, and method for manufacturing the same ELPIDA MEMORY, INC. (JP) 2011-10-04 US disclosed
US-20100289143-A1 METHOD FOR PRODUCING LOW-k FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME ELPIDA MEMORY, INC (JP) 2010-11-18 US disclosed
US-20090110838-A1 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD (JP) 2009-04-30 US disclosed
US-20060047034-A1 Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film HITACHI CHEMICAL CO., LTD. (JP) 2006-03-02 US disclosed