Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB4 known ✓ | P30926 | 1/20 | 0.46 |
| ▸ | CHRNA3 known ✓ | P32297 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.52 |
| ▸ | TSHR | P16473 | 2/20 | 0.52 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.46 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.46 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.46 |
| ▸ | PGR | P06401 | 1/20 | 0.46 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.46 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.46 |
| ▸ | HTR1A | P08908 | 1/20 | 0.46 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.46 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.46 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.46 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.46 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.46 |
| ▸ | GALR3 | O60755 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Peroxide SCHEMBL28176177 | 0.97 | ALDH1A1 (0.54) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL28307391 | 0.95 | ALDH1A1 (0.56) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL11060536 | 0.95 | ALDH1A1 (0.56) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL4002515 | 0.95 | ALDH1A1 (0.56) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL24200 | 0.95 | — | — | |
| Acetic Acid SCHEMBL28166428 | 0.93 | ALDH1A1 (0.58) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| Acetic Acid SCHEMBL4002516 | 0.93 | ALDH1A1 (0.46) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| SCHEMBL4412526 | 0.92 | — | — | |
| Methyl Alcohol SCHEMBL3842726 | 0.92 | ALDH1A1 (0.54) | ALDH1A1TSHRCHRM5CHRM1CHRM3 | |
| Acetone SCHEMBL9495889 | 0.92 | ALDH1A1 (0.54) | ALDH1A1TSHRCHRM5CHRM1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103492546-A | Preparations for all-purpose cleaning compositions | RHODIA POLIAMIDA E ESPECIALIDADES LTDA | 2014-01-01 | — | — | CN | claimed |
| WO-2020204513-A1 | SUBSTRATE FOR HEAT-RESISTANT ELECTRONIC DEVICE | 주식회사 엘지화학 | 2020-10-08 | — | — | WO | disclosed |
| CN-105960419-B | (methyl) acrylate compounds and its manufacture method | 三菱瓦斯化学株式会社 | 2018-03-16 | — | — | CN | disclosed |
| CN-103492546-A | Preparations for all-purpose cleaning compositions | RHODIA POLIAMIDA E ESPECIALIDADES LTDA | 2014-01-01 | — | — | CN | disclosed |
| US-8466229-B2 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD. (JP) | 2013-06-18 | — | — | US | disclosed |
| US-8253251-B2 | Method for producing low-k film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2012-08-28 | — | — | US | disclosed |
| US-8030221-B2 | Method for producing low-k l film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100289143-A1 | METHOD FOR PRODUCING LOW-k FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME | ELPIDA MEMORY, INC (JP) | 2010-11-18 | — | — | US | disclosed |
| US-7687590-B2 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-7682701-B2 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2010-03-23 | — | — | US | disclosed |
| US-20090110838-A1 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD (JP) | 2009-04-30 | — | — | US | disclosed |
| US-7358300-B2 | Comprising polysiloxane obtained by hydrolytic condensation; alcoholic solvent alcohol capable of dissolving siloxane resin, ammonium salt, and thermal decomposing/volatile compound; curing; bonding and high strength; mechanical properties | HITACHI CHEMICAL CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| US-20060052566-A1 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2006-03-09 | — | — | US | disclosed |
| US-20060047034-A1 | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film | HITACHI CHEMICAL CO., LTD. (JP) | 2006-03-02 | — | — | US | disclosed |
| US-20050255326-A1 | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts | HITACHI CHEMICAL CO., LTD. (JP) | 2005-11-17 | — | — | US | disclosed |
| US-20050119394-A1 | Comprising polysiloxane obtained by hydrolytic condensation; alcoholic solvent alcohol capable of dissolving siloxane resin, ammonium salt, and thermal decomposing/volatile compound; curing; bonding and high strength; mechanical properties | HITACHI CHEMICAL CO., LTD. (JP) | 2005-06-02 | — | — | US | disclosed |