SCHEMBL250246

SCHEMBL250246

C=CCC(=O)NS(=O)(=O)CC=C

nearest known ligand 0.30

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL250244 1.00 TSHR (0.30) TSHRSMN1; SMN2MAPT
SCHEMBL6438119 0.77 NPSR1 (0.32)
SCHEMBL9228498 0.77 TSHR (0.32) TSHRSMN1; SMN2MAPT
SCHEMBL7737385 0.77
SCHEMBL8521945 0.76 ALDH1A1 (0.31) TSHRSMN1; SMN2MAPT
SCHEMBL27396819 0.76 ALDH1A1 (0.41) SMN1; SMN2
SCHEMBL2701609 0.76 MAPT (0.33) TSHRMAPT
SCHEMBL8694565 0.76 ALDH1A1 (0.32) TSHRSMN1; SMN2
SCHEMBL2155070 0.76 TSHR (0.41) TSHR
SCHEMBL3455596 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 574 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210294212-A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2021-09-23 US claimed
EP-1811339-B1 Pattern forming method FUJIFILM CORP (JP) 2021-03-17 EP claimed
EP-2756353-B1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORP (JP) 2019-05-01 EP claimed
US-9170489-B2 Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device FUJIFILM CORPORATION (JP) 2015-10-27 US claimed
EP-2756353-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2014-07-23 EP claimed
US-20140193749-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-07-10 US claimed
WO-2013039243-A1 PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-03-21 WO claimed
EP-1590358-A1 9-KETOSPINOSYN DERIVATIVES Bayer CropScience Aktiengesellschaft (DE) 2005-11-02 EP claimed
US-20040171488-A1 N-aryl-uracils based Herbicides FEUCHT DIETER (DE) 2004-09-02 US claimed
WO-2004065402-A1 9-KETOSPINOSYN DERIVATIVES BAYER CROPSCIENCE AKTIENGESELLSCHAFT (DE) 2004-08-05 WO claimed
WO-2000078734-A1 SUBSTITUTED HERBICIDAL PHENYLURACILS BAYER AKTIENGESELLSCHAFT (DE) 2000-12-28 WO claimed
EP-1049376-A1 SELECTIVE HERBICIDES BASED ON N-ARYL- TRIAZOLINE(THI)ONS AND N-ARLYSULFONYLAMINO (THIO)CARBONYL- TRIAZOLINE(THI) ONS Bayer Aktiengesellschaft (DE) 2000-11-08 EP claimed
EP-1021417-A1 SUBSTITUTED PHENYLURACILS Bayer Aktiengesellschaft (DE) 2000-07-26 EP claimed
EP-0946544-A1 HETEROCYCLYLURACIL BAYER AG (DE) 1999-10-06 EP claimed
EP-0946543-A1 HETEROCYCLYLURACILE BAYER AG (DE) 1999-10-06 EP claimed
WO-1999037153-A1 SELECTIVE HERBICIDES BASED ON N-ARYL- TRIAZOLINE(THI)ONS AND N-ARLYSULFONYLAMINO (THIO)CARBONYL- TRIAZOLINE(THI) ONS BAYER AKTIENGESELLSCHAFT (DE) 1999-07-29 WO claimed
WO-1999012913-A1 SUBSTITUTED PHENYLURACILS BAYER AKTIENGESELLSCHAFT (DE) 1999-03-18 WO claimed
WO-1998027083-A1 HETEROCYCLYL URACILS BAYER AKTIENGESELLSCHAFT (DE) 1998-06-25 WO claimed
WO-1998027082-A1 HETEROCYCLYLURACIL BAYER AKTIENGESELLSCHAFT (DE) 1998-06-25 WO claimed
WO-1998027088-A1 HETEROCYCLYLURACILS BAYER AKTIENGESELLSCHAFT (DE) 1998-06-25 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040171488-A1 N-aryl-uracils based Herbicides DDT, UNG, DDC TSHR 3576/4885SMN1; SMN2 3395/4885MAPT 3439/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.