⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL474807 | 0.86 | ALDH1A1 (0.36) | — | |
| SCHEMBL28003156 | 0.77 | — | — | |
| SCHEMBL27635425 | 0.75 | — | — | |
| Butane SCHEMBL3799640 | 0.74 | TSHR (0.33) | — | |
| SCHEMBL5049758 | 0.72 | TSHR (0.31) | — | |
| Butadiene SCHEMBL1066374 | 0.71 | — | — | |
| SCHEMBL27749638 | 0.69 | — | — | |
| Butane SCHEMBL4463544 | 0.69 | ALDH1A1 (0.38) | — | |
| SCHEMBL707582 | 0.69 | — | — | |
| Butane SCHEMBL297926 | 0.67 | TSHR (0.67) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10408984-B2 | Optical phase difference component, composite optical component, incorporating optical phase difference component, and method for manufacturing optical phase difference component | JX NIPPON OIL AND ENERGY CORPORATION (JP) | 2019-09-10 | — | — | US | disclosed |
| US-20170199313-A1 | OPTICAL PHASE DIFFERENCE COMPONENT, COMPOSITE OPTICAL COMPONENT, INCORPORATING OPTICAL PHASE DIFFERENCE COMPONENT, AND METHOD FOR MANUFACTURING OPTICAL PHASE DIFFERENCE COMPONENT | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| EP-3145276-A1 | FILM MEMBER HAVING UNEVEN STRUCTURE | JX Nippon Oil & Energy Corporation (JP) | 2017-03-22 | — | — | EP | disclosed |
| US-20170054112-A1 | FILM MEMBER HAVING UNEVEN STRUCTURE | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| EP-3125312-A1 | EPITAXIAL GROWTH SUBSTRATE AND LIGHT-EMITTING ELEMENT USING SAME | JX Nippon Oil & Energy Corporation (JP) | 2017-02-01 | — | — | EP | disclosed |
| US-20170012169-A1 | EPITAXIAL GROWTH SUBSTRATE AND LIGHT-EMITTING ELEMENT USING SAME | JX NIPPON OIL & ENERGY CORPORATION (JP) | 2017-01-12 | — | — | US | disclosed |
| US-8253251-B2 | Method for producing low-k film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2012-08-28 | — | — | US | disclosed |
| US-8030221-B2 | Method for producing low-k l film, semiconductor device, and method for manufacturing the same | ELPIDA MEMORY, INC. (JP) | 2011-10-04 | — | — | US | disclosed |
| US-20100289143-A1 | METHOD FOR PRODUCING LOW-k FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME | ELPIDA MEMORY, INC (JP) | 2010-11-18 | — | — | US | disclosed |
| US-20090251652-A1 | Silica based positive type photosensitive organic compound | HITACHI CHEMICAL CO., LTD. | 2009-10-08 | — | — | US | disclosed |
| EP-1428828-A1 | PROCESS FOR PREPARATION OF ALKOXYSILANES | TOAGOSEI CO., LTD. (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-6749944-B2 | VAPOR DEPOSITION, OSCILLATION, HEATING USING ORGANOSILICON COMPOUND; FORMING DIELECTRIC | JSR CORPORATION (JP) | 2004-06-15 | — | — | US | disclosed |
| US-20040013972-A1 | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORPORATION (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1350814-A1 | RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX | JSR Corporation (JP) | 2003-10-08 | — | — | EP | disclosed |
| US-20030077461-A1 | Stacked film, insulating film and substrate for semiconductor | JSR CORPORATION (JP) | 2003-04-24 | — | — | US | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1298176-A2 | Stacked film insulating film and substrate for semiconductor | JSR Corporation (JP) | 2003-04-02 | — | — | EP | disclosed |
| US-20030059628-A1 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR CORPORATION (JP) | 2003-03-27 | — | — | US | disclosed |
| EP-1295924-A2 | Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |