⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methylamine SCHEMBL2795832 | 0.95 | — | — | |
| Dimethylamine SCHEMBL27685470 | 0.92 | — | — | |
| SCHEMBL705840 | 0.84 | — | — | |
| SCHEMBL705323 | 0.83 | LMNA (0.30) | — | |
| SCHEMBL8678585 | 0.81 | TSHR (0.33) | — | |
| SCHEMBL6009905 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL27959511 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL27781685 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL3757875 | 0.79 | TSHR (0.38) | — | |
| SCHEMBL27499960 | 0.79 | TSHR (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116963829-A | Ultraviolet irradiation device and method for purifying organic compound | 株式会社德山 | 2023-10-27 | — | — | CN | disclosed |
| EP-3691894-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | Maxterial, Inc. (US) | 2020-08-12 | — | — | EP | disclosed |
| CN-105017841-B | Organic solvent dispersion of titanium oxide solid solution particles, method of preparation and coating composition | 信越化学工业株式会社 | 2020-01-17 | — | — | CN | disclosed |
| WO-2019067950-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | MAXTERIAL, INC. (US) | 2019-04-04 | — | — | WO | disclosed |
| EP-3397788-A1 | COATINGS AND COATED SURFACES WITH SELECTED SURFACE CHARACTERISTICS AND FEATURES | Maxterial, Inc. (US) | 2018-11-07 | — | — | EP | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| CN-101812304-A | Liquid crystal aligning agent, liquid crystal display device and manufacture method thereof | JSR CO LTD | 2010-08-25 | — | — | CN | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |