Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 3/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25301121 | 1.00 | DNM1 (0.37) | DNM1TSHRTHRB | |
| SCHEMBL1204222 | 1.00 | DNM1 (0.37) | DNM1TSHRTHRB | |
| SCHEMBL27834370 | 1.00 | DNM1 (0.37) | DNM1TSHRTHRB | |
| SCHEMBL328756 | 0.91 | — | — | |
| SCHEMBL2503495 | 0.80 | — | — | |
| SCHEMBL28922190 | 0.75 | TSHR (0.44) | DNM1TSHRTHRB | |
| Octane SCHEMBL27556408 | 0.74 | DNM1 (0.42) | DNM1TSHRTHRB | |
| Hexane SCHEMBL4630266 | 0.73 | DNM1 (0.36) | DNM1TSHRTHRB | |
| SCHEMBL17024459 | 0.66 | TSHR (0.53) | DNM1TSHRTHRB | |
| SCHEMBL22283393 | 0.66 | TSHR (0.53) | DNM1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9293417-B2 | Method for forming barrier film on wiring line | TOKYO ELECTRON LIMITED (JP) | 2016-03-22 | — | — | US | claimed |
| CN-104245132-A | High activity catalyst for hydrosilylation reactions and methods of making the same | MOMENTIVE PERFORMANCE MAT INC | 2014-12-24 | — | — | CN | claimed |
| US-8709541-B2 | Method for forming a film | TOKYO ELECTRON LIMITED (JP) | 2014-04-29 | — | — | US | claimed |
| US-20120251721-A1 | DEVICE AND METHOD FOR FORMING FILM | TOKYO ELECTRON LIMITED (JP) | 2012-10-04 | — | — | US | claimed |
| US-20120114869-A1 | FILM FORMING METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-05-10 | — | — | US | claimed |
| US-7129187-B2 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED (JP) | 2006-10-31 | — | — | US | claimed |
| WO-2006019438-A2 | LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON-NITROGEN-CONTAINING FILMS | TOKYO ELECTRON LIMITED (JP) | 2006-02-23 | — | — | WO | claimed |
| US-20060014399-A1 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED | 2006-01-19 | — | — | US | claimed |
| US-10378105-B2 | Selective deposition with surface treatment | TOKYO ELECTRON LIMITED (JP) | 2019-08-13 | — | — | US | disclosed |
| CN-109235048-A | A kind of preparation method of fire-retardant air duct cloth material | 孝感寰誉新材科技有限公司 | 2019-01-18 | — | — | CN | disclosed |
| CN-107427838-A | For separating the composition and method of fluid | 莫门蒂夫性能材料股份有限公司 | 2017-12-01 | — | — | CN | disclosed |
| US-20170342553-A1 | SELECTIVE DEPOSITION WITH SURFACE TREATMENT | TOKYO ELECTRON LIMITED (JP) | 2017-11-30 | — | — | US | disclosed |
| CN-104245132-B | High activated catalyst and its preparation method for hydrosilylation reactions | 莫门蒂夫性能材料股份有限公司 | 2017-09-22 | — | — | CN | disclosed |
| US-9293417-B2 | Method for forming barrier film on wiring line | TOKYO ELECTRON LIMITED (JP) | 2016-03-22 | — | — | US | disclosed |
| WO-2002023625-A2 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR | TOKYO ELECTRON LIMITED (JP) | 2002-03-21 | — | — | WO | disclosed |
| EP-0535947-B1 | Inorganic acid catalyzed silylation reactions | DOW CORNING (US) | 2000-05-03 | — | — | EP | disclosed |
| US-5824442-A | CONTROLLING DEVELOPMENT AND DEVELOPMENT FOR ELECTROSTATIC IMAGES WITH THIN FILMS | CANON KABUSHIKI KAISHA (JP) | 1998-10-20 | — | — | US | disclosed |
| US-5707770-A | TITANIA OR ALUMINA PARTICLES SURFACE TREATED WITH A SILICON COMPOUND OR SILICONE OIL, IMPROVED PERFORMANCE IN HIGH HUMIDITY | CANON KABUSHIKI KAISHA (JP) | 1998-01-13 | — | — | US | disclosed |
| US-5157139-A | Inorganic acid catalysed silylation reactions | DOW CORNING CORPORATION (US) | 1992-10-20 | — | — | US | disclosed |
| US-4333564-A | Method of controlling rheological properties of gel-like compositions | SHERWOOD MEDICAL INDUSTRIES INC. (US) | 1982-06-08 | — | — | US | disclosed |