SCHEMBL2509044

SCHEMBL2509044

[SiH3]N[Si](c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.35
ESR1 P03372 1/20 0.32
ESR2 Q92731 1/20 0.32
ALDH1A1 P00352 4/20 0.32
TDP1 Q9NUW8 2/20 0.32
HSD17B10 Q99714 2/20 0.32
CTSD P07339 1/20 0.32
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
ALOX15 P16050 1/20 0.30
ALOX12 P18054 1/20 0.30
PTGS1 P23219 1/20 0.30
SLC6A2 P23975 1/20 0.30
MAPK1 P28482 1/20 0.30
PTGS2 P35354 1/20 0.30
HTR2B P41595 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL146839 0.75 TDP1 (0.35) TSHRESR1ESR2ALDH1A1TDP1
SCHEMBL4577783 0.72 ESR1 (0.39) TSHRESR1ESR2ALOX12
SCHEMBL49919 0.71 TSHR (0.41) TSHRESR1ESR2ALDH1A1TDP1
SCHEMBL49707 0.69 ALDH1A1 (0.43) TSHRALDH1A1TDP1HSD17B10CTSD
SCHEMBL30927813 0.69 ESR1 (0.31) ESR1ESR2ALDH1A1TDP1HSD17B10
SCHEMBL8763125 0.67 ALDH1A1 (0.44) TSHRESR1ESR2ALDH1A1TDP1
SCHEMBL7896320 0.67 ESR1 (0.39) TSHRESR1ESR2NPC1RAB9A
SCHEMBL2268924 0.67 KCNN4 (0.39) TSHRESR1ESR2ALDH1A1NPC1
SCHEMBL7685712 0.67 ESR1 (0.39) TSHRESR1ESR2NPC1RAB9A
SCHEMBL7761636 0.65 TSHR (0.42) TSHRALDH1A1TDP1HSD17B10NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108864428-B Boron-containing silicone oil with heat-resistant and aging-resistant main chain belt pyridine structure and preparation method thereof 合肥工业大学 2021-04-06 CN claimed
US-9012133-B2 Removal of alkaline crystal defects in lithographic patterning INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-21 US claimed
US-7129187-B2 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films TOKYO ELECTRON LIMITED (JP) 2006-10-31 US claimed
WO-2006019438-A2 LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON-NITROGEN-CONTAINING FILMS TOKYO ELECTRON LIMITED (JP) 2006-02-23 WO claimed
US-20060014399-A1 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films TOKYO ELECTRON LIMITED 2006-01-19 US claimed
EP-4382481-A1 HETEROATOM-DOPED NANODIAMOND PARTICLES AND METHOD FOR PRODUCING HETEROATOM-DOPED NANODIAMOND PARTICLES Daicel Corporation (JP) 2024-06-12 EP disclosed
CN-117794856-A Heteroatom-doped nanodiamond particles and method for producing heteroatom-doped nanodiamond particles 株式会社大赛璐 2024-03-29 CN disclosed
US-20240044722-A1 TEMPERATURE SENSITIVE PROBE DAICEL CORPORATION (JP) 2024-02-08 US disclosed
EP-4269969-A1 TEMPERATURE SENSITIVE PROBE Daicel Corporation (JP) 2023-11-01 EP disclosed
CN-116670501-A Temperature sensitive probe 株式会社大赛璐 2023-08-29 CN disclosed
WO-2023063015-A1 HETEROATOM-DOPED NANODIAMOND PARTICLE 株式会社ダイセル 2023-04-20 WO disclosed
WO-2023013659-A1 HETEROATOM-DOPED NANODIAMOND PARTICLES AND METHOD FOR PRODUCING HETEROATOM-DOPED NANODIAMOND PARTICLES 株式会社ダイセル 2023-02-09 WO disclosed
EP-1320884-A2 SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR TOKYO ELECTRON LIMITED (JP) 2003-06-25 EP disclosed
WO-2002023625-A2 SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR TOKYO ELECTRON LIMITED (JP) 2002-03-21 WO disclosed
US-6136489-A A CARRIER FOR THE DEVELOPMENT OF AN ELECTROSTATIC IMAGE COMPRISING A MAGNETIC METAL OR OXIDE INCORPORATED AS A CORE MATERIAL, WHICH BEING COATED WITH RESIN, AND CARRIER ALSO CONTAINS CARBON BLACK MITSUBISHI CHEMICAL CORPORATION (JP) 2000-10-24 US disclosed
US-6017670-A COLORANT ENCAPSULATED IN SPHERICAL PARTICLES OF A BINDER RESIN COMPRISING A PHASE INVERSION EMULSIFIED AND CROSSLINKED STYRENE-ACRYLIC RESIN DAINIPPON INK AND CHEMICALS, INC. (JP) 2000-01-25 US disclosed
US-5885743-A IMPROVED IN THE THERMAL FIXING CHARACTERISTICS AND THE ENVIRONMENTAL STABILITY OF CHARGING, EXHIBITS A WIDE FIXING TEMPERATURE WIDTH AT THE HEATED ROLL FIXING AND HAS EXCELLENT TRIBOELECTRICITY DAINIPPON INK AND CHEMICALS, INC. (JP) 1999-03-23 US disclosed
US-5501931-A DYE OR PIGMENT, STYRENE POLYMER, POLYESTER OR EPOXY RESIN MITSUBISHI KASEI CORPORATION (JP) 1996-03-26 US disclosed
EP-0639800-A1 Toner for flash fixation Mitsubishi Chemical Corporation (JP) 1995-02-22 EP disclosed
US-5244764-A Electrostatic image-developing toner and developer MITSUBISHI KASEI CORPORATION (JP) 1993-09-14 US disclosed