Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 1/20 | 0.35 |
| ▸ | HTR6 | P50406 | 1/20 | 0.35 |
| ▸ | BRD4 | O60885 | 1/20 | 0.33 |
| ▸ | CCL2 | P13500 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL194747 | 0.79 | HTR2A (0.38) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| SCHEMBL3259048 | 0.77 | HTR6 (0.31) | HTR2AHTR6 | |
| SCHEMBL29393845 | 0.75 | HTR2A (0.38) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| SCHEMBL2951329 | 0.75 | HTR2A (0.38) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| SCHEMBL2364504 | 0.75 | HTR2A (0.38) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| SCHEMBL9370624 | 0.75 | HTR2A (0.38) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| Hydrochloric Acid SCHEMBL8522504 | 0.73 | HTR2A (0.36) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| Hydrochloric Acid SCHEMBL8522502 | 0.73 | HTR2A (0.36) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| Fluoride SCHEMBL29462970 | 0.73 | HTR2A (0.36) | HTR2AHTR6BRD4CCL2CYP2D6 | |
| Fluoride SCHEMBL178212 | 0.73 | HTR2A (0.36) | HTR2AHTR6BRD4CCL2CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-4172461-A | — | — | None | — | — | JP | disclosed |
| JP-7287879-A | — | — | None | — | — | JP | disclosed |
| JP-3257817-A | — | — | None | — | — | JP | disclosed |
| US-20190204737-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD (KR) | 2019-07-04 | — | — | US | disclosed |
| CN-104909581-B | It is used to form the pre-treating method of the glass substrate of etching mask | 东京应化工业株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-106444289-A | UV irradiation apparatus, resist pattern forming apparatus, UV irradiation method, and resist pattern forming method | 东京应化工业株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-104909581-A | Pretreatment method of glass substrate used for forming etching mask | TOKYO OHKA KOGYO COMPANY | 2015-09-16 | — | — | CN | disclosed |
| CN-104185773-A | Inertial force sensor | PANASONIC CORP | 2014-12-03 | — | — | CN | disclosed |
| US-20140083458-A1 | PHOTORESIST STRIPPING SOLUTION, STRIPPING SOLUTION RECYCLING SYSTEM AND OPERATING METHOD, AND METHOD FOR RECYCLING STRIPPING SOLUTION | PANASONIC CORPORATION (JP) | 2014-03-27 | — | — | US | disclosed |
| CN-103547708-A | Method of machining metal plate for manufacturing scaled model, method of manufacturing scaled model, and scaled model | KIM IL WEON | 2014-01-29 | — | — | CN | disclosed |
| US-20130160548-A1 | INERTIAL FORCE SENSOR | PANASONIC CORPORATION (JP) | 2013-06-27 | — | — | US | disclosed |
| WO-2012161430-A2 | METHOD OF MACHINING METAL PLATE FOR MANUFACTURING SCALED MODEL, METHOD OF MANUFACTURING SCALED MODEL, AND SCALED MODEL | KIM IL-WEON (KR) | 2012-11-29 | — | — | WO | disclosed |
| US-8034529-B2 | Photosensitive resin composition and photosensitive element | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20090214979-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| JP-2000100788-A | RESIST SOLUTION AND FORMATION OF PATTERN | NIPPON TELEGR & TELEPH CORP <NTT> | 2000-04-07 | — | — | JP | disclosed |
| US-5648199-A | SEMICONDUCTORS | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1997-07-15 | — | — | US | disclosed |
| JP-H07287879-A | PRODUCTION OF STAMPER FOR OPTICAL RECORDING MEDIUM | SEIKO EPSON CORP | 1995-10-31 | — | — | JP | disclosed |
| JP-H04172461-A | FORMATION OF RESIST PATTERN | KAWASAKI STEEL CORP | 1992-06-19 | — | — | JP | disclosed |
| JP-H03257817-A | FORMATION OF RESIST PATTERN | DAINIPPON PRINTING CO LTD | 1991-11-18 | — | — | JP | disclosed |
| US-4610953-A | PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1986-09-09 | — | — | US | disclosed |