⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL861682 | 0.90 | — | — | |
| SCHEMBL9666330 | 0.88 | OPRM1 (0.50) | — | |
| SCHEMBL9453912 | 0.88 | OPRM1 (0.50) | — | |
| SCHEMBL6049088 | 0.88 | OPRM1 (0.50) | — | |
| SCHEMBL28563616 | 0.88 | OPRM1 (0.50) | — | |
| SCHEMBL8519501 | 0.88 | — | — | |
| SCHEMBL9668694 | 0.88 | OPRM1 (0.50) | — | |
| SCHEMBL8519345 | 0.88 | OPRM1 (0.50) | — | |
| SCHEMBL28909256 | 0.88 | OPRM1 (0.50) | — | |
| SCHEMBL2518541 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116891572-A | Metal removing method for polysilane compound | 日产化学株式会社 | 2023-10-17 | — | — | CN | disclosed |
| CN-105385456-B | Liquid crystal aligning agent, liquid crystal alignment film and method for producing same, liquid crystal display element, and retardation film and method for producing same | JSR株式会社 | 2020-01-31 | — | — | CN | disclosed |
| CN-104876957-B | Organoaminosilanes and methods for their preparation | 弗萨姆材料美国有限责任公司 | 2019-04-19 | — | — | CN | disclosed |
| EP-2067770-B1 | PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER | WAKO PURE CHEM IND LTD (JP) | 2017-04-12 | — | — | EP | disclosed |
| US-9190695-B2 | Nonaqueous electrolyte solution, method for producing same, and nonaqueous electrolyte battery using the electrolyte solution | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20150244028-A1 | NONAQUEOUS SECONDARY CELL, AND FIRE-RETARDANT AGENT AND ADDITIVE FOR NONAQUEOUS SECONDARY CELL | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-08-27 | — | — | US | disclosed |
| EP-2602855-B1 | NONAQUEOUS ELECTROLYTE SOLUTION, METHOD FOR PRODUCING SAME, AND NONAQUEOUS ELECTROLYTE BATTERY USING THE ELECTROLYTE SOLUTION | WAKO PURE CHEM IND LTD (JP) | 2015-02-18 | — | — | EP | disclosed |
| EP-2821395-A2 | Novel disulfonic acid ester as an additive for an electrolyte for a lithium secondary battery | Wako Pure Chemical Industries, Ltd. (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-8802758-B2 | Polycarbonate resin composition and formed product thereof | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8785528-B2 | Polycarbonate resin composition and formed product thereof | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2014-07-22 | — | — | US | disclosed |
| EP-2602855-A1 | NONAQUEOUS ELECTROLYTE SOLUTION, METHOD FOR PRODUCING SAME, AND NONAQUEOUS ELECTROLYTE BATTERY USING THE ELECTROLYTE SOLUTION | Wako Pure Chemical Industries, Ltd. (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-20130143129-A1 | NONAQUEOUS ELECTROLYTE SOLUTION, METHOD FOR PRODUCING SAME, AND NONAQUEOUS ELECTROLYTE BATTERY USING THE ELECTROLYTE SOLUTION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| EP-2570458-A1 | Polycarbonate resin composition and formed product thereof | Mitsubishi Engineering- Plastics Corporation (JP) | 2013-03-20 | — | — | EP | disclosed |
| US-8269038-B2 | Process for production of sulfonic acid ester | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-09-18 | — | — | US | disclosed |
| EP-2463266-A1 | PROCESS FOR PRODUCTION OF BIS-QUATERNARY AMMONIUM SALT, AND NOVEL INTERMEDIATE | Wako Pure Chemical Industries, Ltd. (JP) | 2012-06-13 | — | — | EP | disclosed |
| US-20120130107-A1 | PROCESS FOR PRODUCTION OF BIS-QUATERNARY AMMONIUM SALT, AND NOVEL INTERMEDIATE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| US-20110313184-A1 | INSULATING FILM MATERIAL, AND FILM FORMATION METHOD UTILIZING THE MATERIAL, AND INSULATING FILM | TAIYO NIPPON SANSO CORPORATION (JP) | 2011-12-22 | — | — | US | disclosed |
| US-20110245388-A1 | POLYCARBONATE RESIN COMPOSITION AND FORMED PRODUCT THEREOF | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20100041916-A1 | PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-2067770-A1 | PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER | Wako Pure Chemical Industries, Ltd. (JP) | 2009-06-10 | — | — | EP | disclosed |