⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL899404 | 0.80 | TDP1 (0.39) | — | |
| SCHEMBL30158913 | 0.78 | — | — | |
| SCHEMBL7336141 | 0.74 | TDP1 (0.38) | — | |
| SCHEMBL7332971 | 0.74 | TDP1 (0.38) | — | |
| SCHEMBL14639737 | 0.74 | TDP1 (0.38) | — | |
| SCHEMBL7332966 | 0.74 | TDP1 (0.38) | — | |
| SCHEMBL821002 | 0.70 | TDP1 (0.39) | — | |
| SCHEMBL13835257 | 0.69 | — | — | |
| SCHEMBL8638465 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL2520828 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8334338-B2 | Composition for forming resist lower layer film | JSR CORPORATION (JP) | 2012-12-18 | — | — | US | disclosed |
| US-20110251323-A1 | COMPOSITION FOR FORMING RESIST LOWER LAYER FILM | JSR CORPORATION | 2011-10-13 | — | — | US | disclosed |