Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2987389 | 0.98 | ALDH1A1 (0.39) | ALDH1A1TSHRMAPTTDP1THRB | |
| SCHEMBL16267586 | 0.82 | TSHR (0.44) | ALDH1A1TSHRATMHPGDEPHX1 | |
| SCHEMBL27928142 | 0.81 | KMT2A (0.41) | ALDH1A1TSHRMAPTL3MBTL1KMT2A | |
| SCHEMBL4590410 | 0.81 | ALDH1A1 (0.39) | ALDH1A1TSHRMAPTTDP1THRB | |
| SCHEMBL11019910 | 0.80 | CYP1A2 (0.40) | ALDH1A1TSHRTHRBATML3MBTL1 | |
| SCHEMBL17159431 | 0.79 | EPHX1 (0.44) | ALDH1A1TSHRMAPTKMT2AHPGD | |
| SCHEMBL4737887 | 0.79 | ALDH1A1 (0.41) | ALDH1A1MAPTTDP1THRBATM | |
| SCHEMBL5072105 | 0.79 | EPHX1 (0.44) | ALDH1A1TSHRMAPTKMT2AHPGD | |
| SCHEMBL4960125 | 0.79 | LMNA (0.45) | ALDH1A1TSHRMAPTTHRBATM | |
| SCHEMBL11018589 | 0.78 | CYP1A2 (0.43) | THRBATML3MBTL1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9840568-B2 | Polymer and method for producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-12-12 | — | — | US | claimed |
| CN-115725015-A | KrF resin, process for producing the same, and chemically amplified photoresist | 阜阳欣奕华材料科技有限公司 | 2023-03-03 | — | — | CN | disclosed |
| CN-115595094-A | Acrylate adhesive, adhesive tape, preparation method and application thereof | 广东新之源技术有限公司（CN） | 2023-01-13 | — | — | CN | disclosed |
| CN-110184006-B | Thermal-stripping adhesive and preparation method thereof | 广东硕成科技有限公司 | 2021-06-15 | — | — | CN | disclosed |
| CN-110184006-B | Thermal-stripping adhesive and preparation method thereof | 广东硕成科技有限公司 | 2021-06-15 | — | — | CN | disclosed |
| US-9840568-B2 | Polymer and method for producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-12-12 | — | — | US | disclosed |
| CN-101547895-B | Photoactive compounds | AZ ELECTRONIC MATERIALS USA | 2014-12-03 | — | — | CN | disclosed |
| US-20140114034-A1 | POLYMER AND METHOD FOR PRODUCING SAME | MITSUBISHI RAYON CO., LTD. (JP) | 2014-04-24 | — | — | US | disclosed |
| CN-102161637-B | Photoactive compound | AZ ELECTRONIC MATERIALS USA | 2013-03-13 | — | — | CN | disclosed |
| CN-102161635-B | Photoactive compound | AZ ELECTRONIC MATERIALS USA | 2013-01-02 | — | — | CN | disclosed |
| CN-101981501-A | A photoresist image-forming process using double patterning | AZ ELECTRONIC MATERIALS USA | 2011-02-23 | — | — | CN | disclosed |
| CN-101981509-A | Process for reducing dimensions between photoresist patterns including a pattern hardening step | AZ ELECTRONIC MATERIALS USA | 2011-02-23 | — | — | CN | disclosed |
| CN-101636421-A | Can be used for polymkeric substance in the photo-corrosion-resisting agent composition and its composition | AZ ELECTRONIC MATERIALS USA | 2010-01-27 | — | — | CN | disclosed |
| US-20090253074-A1 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-10-08 | — | — | US | disclosed |
| CN-101547895-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2009-09-30 | — | — | CN | disclosed |
| CN-101547913-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2009-09-30 | — | — | CN | disclosed |
| CN-101310223-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2008-11-19 | — | — | CN | disclosed |
| WO-2008021291-A2 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-02-21 | — | — | WO | disclosed |
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-20060183051-A1 | Positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-17 | — | — | US | disclosed |