Benzaldehyde

Benzaldehyde

SCHEMBL2519784

O=Cc1ccccc1.O=Cc1ccco1

nearest known ligand 0.75

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.75
CYP2A6 P11509 1/20 0.58
HCAR2 Q8TDS4 1/20 0.46
KMT2A Q03164 5/20 0.45
POLB P06746 5/20 0.45
L3MBTL1 Q9Y468 5/20 0.45
MEN1 O00255 4/20 0.45
NPC1 O15118 2/20 0.45
BLM P54132 1/20 0.45
MCL1 Q07820 1/20 0.45
MAPT P10636 6/20 0.43
F2 P00734 2/20 0.43
HTT P42858 1/20 0.43
MASP2 O00187 1/20 0.42
TSHR P16473 1/20 0.41
CYP2C19 P33261 1/20 0.41
KDM4E B2RXH2 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
PLA2G7 Q13093 1/20 0.40
RECQL P46063 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Maleic Acid SCHEMBL9461014 0.89 ALDH1A1 (0.60) ALDH1A1CYP2A6HCAR2KMT2APOLB
Fumaric Acid SCHEMBL9461015 0.89 ALDH1A1 (0.60) ALDH1A1CYP2A6HCAR2KMT2APOLB
Furfural SCHEMBL27529868 0.89 ALDH1A1 (0.95) ALDH1A1HCAR2KMT2APOLBL3MBTL1
SCHEMBL29634259 0.87 ALDH1A1 (0.81) ALDH1A1CYP2A6HCAR2KMT2APOLB
Furfural SCHEMBL20439 0.87
Furfural SCHEMBL626705 0.87 ALDH1A1 (1.00) ALDH1A1HCAR2KMT2APOLBL3MBTL1
Furfural SCHEMBL10811266 0.87 ALDH1A1 (1.00) ALDH1A1HCAR2KMT2APOLBL3MBTL1
Furfural SCHEMBL2978794 0.84
Furfural SCHEMBL2197116 0.84
Furfural SCHEMBL896786 0.84 ALDH1A1 (0.95) ALDH1A1HCAR2KMT2APOLBL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110088075-A Propionic acid and acrylic acid are separated via azeotropic distillation 伊士曼化工公司 2019-08-02 CN disclosed
US-9786576-B2 Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device HITACHI CHEMICAL COMPANY, LTD (JP) 2017-10-10 US disclosed
EP-2221666-B1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, AND SEMICONDUCTOR DEVICE HITACHI CHEMICAL CO LTD (JP) 2013-09-18 EP disclosed
US-20110250396-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE RESONAC CORPORATION (JP) 2011-10-13 US disclosed
EP-2221666-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE Hitachi Chemical Company, Ltd. (JP) 2010-08-25 EP disclosed
EP-1863827-A1 HYDROGELS FOR THE CONTROLLED RELEASE OF BIOACTIVE MATERIALS FIRMENICH SA (CH) 2007-12-12 EP disclosed
WO-2006100647-A1 HYDROGELS FOR THE CONTROLLED RELEASE OF BIOACTIVE MATERIALS FIRMENICH SA (CH) 2006-09-28 WO disclosed
WO-1997014663-A1 PROCESS FOR THE MANUFACTURE OF REFRACTORY MATERIALS COOKSON GROUP PLC (GB) 1997-04-24 WO disclosed
EP-0426735-B1 FLUOROPOLYMER BASED COATING COMPOSITION FOR ADHESION DIRECT TO GLASS PPG INDUSTRIES INC (US) 1996-01-31 EP disclosed
US-5340888-A Curable mixture of phenolic novolak resin, esterified phenolic compound and base; for foundry molds, cores BORDEN INC. (US) 1994-08-23 US disclosed
EP-0426735-A1 FLUOROPOLYMER BASED COATING COMPOSITION FOR ADHESION DIRECT TO GLASS. PPG INDUSTRIES INC (US) 1991-05-15 EP disclosed
EP-0377996-A1 Phenolic resins BORDEN (UK) LIMITED (GB) 1990-07-18 EP disclosed
WO-1990006903-A1 PHENOLIC RESINS BORDEN (UK) LIMITED (GB) 1990-06-28 WO disclosed
WO-1990001054-A1 FLUOROPOLYMER BASED COATING COMPOSITION FOR ADHESION DIRECT TO GLASS PPG INDUSTRIES, INC. (US) 1990-02-08 WO disclosed