SCHEMBL25222763

SCHEMBL25222763

O=P(O)(O)Oc1c(C(Cl)(Cl)Cl)cccc1C(Cl)(Cl)Cl

nearest known ligand 0.53

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
INPPL1 O15357 8/20 0.53
INPP5A Q14642 6/20 0.53
INPP5B P32019 2/20 0.53
AKT1 P31749 1/20 0.47
SRC P12931 7/20 0.42
PGK1 P00558 1/20 0.38
PGK2 P07205 1/20 0.38
KDM4E B2RXH2 1/20 0.35
USP2 O75604 1/20 0.35
ALDH1A1 P00352 1/20 0.35
HPGD P15428 1/20 0.35
PDE3A Q14432 1/20 0.35
HSD17B10 Q99714 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25273588 0.82 INPPL1 (0.55) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL25273673 0.80 INPPL1 (0.53) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL11364581 0.80 INPPL1 (0.53) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL25269497 0.80 INPPL1 (0.53) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL29046930 0.78 INPPL1 (0.52) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL3468743 0.78 INPPL1 (0.52) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL25222936 0.78 INPPL1 (0.52) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL25222316 0.77 INPPL1 (0.59) INPPL1INPP5AINPP5BAKT1SRC
Resorcinol SCHEMBL28172840 0.72 INPPL1 (0.44) INPPL1INPP5AINPP5BAKT1SRC
SCHEMBL5850955 0.71 GPR84 (0.41) INPPL1INPP5AINPP5BAKT1SRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed
CN-115398342-A Film-forming composition 日产化学株式会社 2022-11-25 CN disclosed