⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7071804 | 0.71 | — | — | |
| SCHEMBL7131893 | 0.62 | — | — | |
| SCHEMBL9676099 | 0.62 | — | — | |
| SCHEMBL8500664 | 0.62 | — | — | |
| SCHEMBL7760946 | 0.61 | ALDH1A1 (0.30) | — | |
| SCHEMBL5416551 | 0.59 | — | — | |
| SCHEMBL11886129 | 0.59 | — | — | |
| SCHEMBL25271762 | 0.59 | — | — | |
| SCHEMBL87425 | 0.59 | — | — | |
| SCHEMBL25423605 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250069948-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2025-02-27 | — | — | US | claimed |
| EP-4448831-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | Lam Research Corporation (US) | 2024-10-23 | — | — | EP | claimed |
| CN-118434908-A | Metal deposition in recessed features using halogen-containing deposition inhibitors | 朗姆研究公司 | 2024-08-02 | — | — | CN | claimed |
| WO-2023114640-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| US-20260136848-A1 | DEPOSITION OF METAL-CONTAINING FILMS | LAM RES CORP (US) | 2026-05-14 | — | — | US | disclosed |
| US-20250069948-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2025-02-27 | — | — | US | disclosed |
| EP-4448831-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | Lam Research Corporation (US) | 2024-10-23 | — | — | EP | disclosed |
| CN-118434908-A | Metal deposition in recessed features using halogen-containing deposition inhibitors | 朗姆研究公司 | 2024-08-02 | — | — | CN | disclosed |
| WO-2024081263-A1 | DEPOSITION OF METAL-CONTAINING FILMS | LAM RESEARCH CORPORATION (US) | 2024-04-18 | — | — | WO | disclosed |
| WO-2023114640-A1 | DEPOSITION OF METALS IN RECESSED FEATURES WITH THE USE OF HALOGEN-CONTAINING DEPOSITION INHIBITORS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |