SCHEMBL2523959

SCHEMBL2523959

CCc1cc(S(=O)(=O)O)ccc1S(=O)(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
HSD17B10 Q99714 5/20 0.41
CASP6 P55212 2/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
LMNA P02545 2/20 0.40
TSHR P16473 3/20 0.39
NT5E P21589 1/20 0.39
HPGD P15428 2/20 0.39
HIF1A Q16665 1/20 0.39
TDP1 Q9NUW8 2/20 0.38
PTPN11 Q06124 1/20 0.38
KDM4E B2RXH2 1/20 0.38
S1PR3 Q99500 1/20 0.38
SNCA P37840 2/20 0.38
CA2 P00918 2/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA7 P43166 1/20 0.37
CA14 Q9ULX7 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2528809 0.87 HSD17B10 (0.39) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL5115210 0.84 ALDH1A1 (0.41) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL2527950 0.84 S1PR3 (0.43) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL16563106 0.83 S1PR3 (0.45) ALDH1A1LMNATSHRHPGDTDP1
SCHEMBL9154391 0.82 ALDH1A1 (0.44) ALDH1A1HSD17B10CASP6CYP2C9CYP2C19
SCHEMBL16563961 0.81 S1PR3 (0.47) ALDH1A1LMNATSHRHPGDTDP1
SCHEMBL7787174 0.81 S1PR3 (0.47) ALDH1A1LMNATSHRHPGDTDP1
SCHEMBL339909 0.81 S1PR3 (0.47) ALDH1A1LMNATSHRHPGDTDP1
SCHEMBL7787208 0.81 S1PR3 (0.47) ALDH1A1LMNATSHRHPGDTDP1
SCHEMBL7787192 0.81 S1PR3 (0.47) ALDH1A1LMNATSHRHPGDTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150125985-A1 ETCHING FLUID AND PRODUCTION METHOD FOR SILICON-BASED SUBSTRATE USING SAME WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-07 US disclosed
EP-2849211-A1 ETCHING FLUID AND PRODUCTION METHOD FOR SILICON-BASED SUBSTRATE USING SAME Wako Pure Chemical Industries, Ltd. (JP) 2015-03-18 EP disclosed
EP-2671903-A1 METHOD FOR PRODUCING RESIN FILM USING ELECTROCONDUCTIVE RESIN COMPOSITION Nitto Denko Corporation (JP) 2013-12-11 EP disclosed
US-20130320268-A1 METHOD FOR PRODUCING RESIN FILM USING ELECTROCONDUCTIVE RESIN COMPOSITION NITTO DENKO CORPORATION (JP) 2013-12-05 US disclosed
CN-103339169-A Method for producing resin film using electroconductive resin composition NITTO DENKO CORP 2013-10-02 CN disclosed
EP-1988135-B1 Ink, ink jet recording method, ink cartridge, recording unit, and ink jet recording apparatus CANON KK (JP) 2013-04-03 EP disclosed
US-8039057-B2 Forming a polyimide compound containing a polymeric conductive agent into a film shape; exposing the film to high temperature and humidity FUJI XEROX CO., LTD. (JP) 2011-10-18 US disclosed
US-7593676-B2 Image-forming apparatus with improved intermediate transfer body FUJI XEROX CO., LTD. (JP) 2009-09-22 US disclosed
US-20080280226-A1 Polyimide film, image-forming apparatus, method for producing the polyimide film, and method for producing the intermediate transfer belt FUJI XEROX CO., LTD. (JP) 2008-11-13 US disclosed
US-20080107457-A1 Image-forming apparatus FUJI XEROX CO., LTD. (JP) 2008-05-08 US disclosed
US-20070025740-A1 Intermediate transfer belt, production method thereof, and image-forming device using the intermediate transfer belt FUJI XEROX CO., LTD. (JP) 2007-02-01 US disclosed
US-20050214554-A1 Polyimide film, image-forming apparatus, method for producing the polyimide film, and method for producing the intermediate transfer belt FUJI XEROX CO., LTD. (JP) 2005-09-29 US disclosed
US-5436796-A Polyaniline in undoped state, second polymer having ester or amide groups, protonic acid NITTO DENKO CORPORATION (JP) 1995-07-25 US disclosed