⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3849019 | 0.97 | — | — | |
| SCHEMBL1696050 | 0.71 | — | — | |
| SCHEMBL1538986 | 0.71 | — | — | |
| SCHEMBL2522520 | 0.71 | — | — | |
| SCHEMBL2527583 | 0.71 | — | — | |
| SCHEMBL1242740 | 0.71 | — | — | |
| SCHEMBL31375451 | 0.71 | — | — | |
| SCHEMBL3617414 | 0.69 | — | — | |
| SCHEMBL1257228 | 0.69 | TSHR (0.30) | — | |
| SCHEMBL5611243 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-12583178-B2 | Systems and methods for stereolithography three-dimensional printing | Southwest Greene International, Inc. (US) | 2026-03-24 | — | — | US | disclosed |
| EP-4605227-A2 | SYSTEMS AND METHODS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING | Southwest Greene International, Inc. (US) | 2025-08-27 | — | — | EP | disclosed |
| WO-2024178383-A2 | SYSTEMS AND METHODS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING | SOUTHWEST GREEN INTERNATIONAL, INC. (US) | 2024-08-29 | — | — | WO | disclosed |
| US-20240140030-A1 | SYSTEMS AND METHODS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING | Southwest Greene International, Inc. | 2024-05-02 | — | — | US | disclosed |
| WO-2024086660-A2 | SYSTEMS AND METHODS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING | HOLO, INC. (US) | 2024-04-25 | — | — | WO | disclosed |
| EP-4326531-A1 | SYSTEMS AND METHODS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING | Holo, Inc. (US) | 2024-02-28 | — | — | EP | disclosed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | disclosed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | disclosed |
| US-5676745-A | HEATING THE CERAMIC POWDER WITH AN ORGANOMETALLIC COMPOUND CHEMICAL INTERMEDIATE TO DECOMPOSE, FORMING A POROUS BODY | THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF COMMERCE (US) | 1997-10-14 | — | — | US | disclosed |