SCHEMBL25288484

SCHEMBL25288484

Oc1ccc(-c2nc3ccccc3s2)cc1-c1nc2ccccc2s1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 10/20 0.71
MAPT P10636 9/20 0.71
RAB9A P51151 9/20 0.71
NPC1 O15118 8/20 0.71
KMT2A Q03164 6/20 0.71
SMN1; SMN2 Q16637 5/20 0.71
MEN1 O00255 5/20 0.71
GAA P10253 4/20 0.71
HSD17B10 Q99714 4/20 0.71
APP P05067 4/20 0.71
POLB P06746 2/20 0.71
THRB P10828 1/20 0.71
ALOX15 P16050 1/20 0.71
CASP1 P29466 1/20 0.71
SNCA P37840 1/20 0.71
CASP7 P55210 1/20 0.71
TDP1 Q9NUW8 1/20 0.71
L3MBTL1 Q9Y468 1/20 0.71
ALDH1A1 P00352 5/20 0.66
GLA P06280 3/20 0.66

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2789607 0.91 KDM4E (0.68) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL9293186 0.89 KDM4E (0.74) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL30714873 0.89 KDM4E (0.74) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL2790324 0.88 MAPT (0.64) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL2789035 0.87 KDM4E (0.63) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL2787764 0.87 MAPT (0.63) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL12470903 0.87 KDM4E (0.69) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL30466258 0.87 KDM4E (0.69) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL30714885 0.87 KDM4E (0.59) KDM4EMAPTRAB9ANPC1KMT2A
SCHEMBL30172485 0.86 KDM4E (0.79) KDM4EMAPTRAB9ANPC1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023120077-A1 COMPOSITION, AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-06-29 WO disclosed
WO-2023120077-A1 COMPOSITION, AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-06-29 WO disclosed