⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2527134 | 0.84 | ALDH1A1 (0.42) | — | |
| Ethylene Glycol SCHEMBL27955270 | 0.82 | CYP2C19 (0.52) | — | |
| SCHEMBL2532461 | 0.82 | GPR84 (0.42) | — | |
| SCHEMBL14860212 | 0.81 | — | — | |
| SCHEMBL2533535 | 0.80 | GPR84 (0.46) | — | |
| SCHEMBL2527255 | 0.80 | GPR84 (0.46) | — | |
| SCHEMBL13879345 | 0.80 | ALDH1A1 (0.48) | — | |
| SCHEMBL36990 | 0.78 | CYP2C19 (0.59) | — | |
| SCHEMBL10834211 | 0.78 | CYP2C19 (0.59) | — | |
| SCHEMBL104701 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106179142-B | A kind of preparation method of photothermal response type essence capsule | 上海应用技术学院 | 2019-06-28 | — | — | CN | claimed |
| US-8461135-B2 | Boron-containing small molecules as anti-inflammatory agents | ANACOR PHARMACEUTICALS, INC. (US) | 2013-06-11 | — | — | US | claimed |
| US-8039450-B2 | Boron-containing small molecules as anti-inflammatory agents | ANACOR PHARMACEUTICALS, INC. (US) | 2011-10-18 | — | — | US | claimed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-12001138-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| US-11934100-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-19 | — | — | US | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| EP-3796086-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-02-28 | — | — | EP | disclosed |
| US-11914295-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230333472-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230305405-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-9994881-B2 | Functionalized carboxylic acids and alcohols by reverse fatty acid oxidation in engineered microbes | WILLIAM MARSH RICE UNIVERSITY (US) | 2018-06-12 | — | — | US | disclosed |
| EP-2753689-B1 | FUNCTIONALIZED CARBOXYLIC ACIDS AND ALCOHOLS BY REVERSE FATTY ACID OXIDATION | UNIV RICE WILLIAM M (US) | 2018-02-14 | — | — | EP | disclosed |
| US-8992790-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20140273110-A1 | FUNCTIONALIZED CARBOXYLIC ACIDS AND ALCOHOLS BY REVERSE FATTY ACID OXIDATION | WILLIAM MARSH RICE UNIVERSITY (US) | 2014-09-18 | — | — | US | disclosed |
| US-20130284699-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| EP-2657767-A1 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| EP-2209381-A1 | DIFFERENTIAL EVAPORATION POTENTIATED DISINFECTANT SYSTEM | XY, LLC (US) | 2010-07-28 | — | — | EP | disclosed |
| WO-2009038672-A1 | DIFFERENTIAL EVAPORATION POTENTIATED DISINFECTANT SYSTEM | XY, INC. (US) | 2009-03-26 | — | — | WO | disclosed |
| US-4443448-A | ANALGESICS, ANTIDEPRESSANTS, NEUROLEPTICS | KEFALAS A/S (DK) | 1984-04-17 | — | — | US | disclosed |