SCHEMBL2533403

SCHEMBL2533403

C=C(CC1CCC(CC(=C)C(=O)O)CC1)C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 5/20 0.36
TET3 O43151 1/20 0.36
TET1 Q8NFU7 1/20 0.36
ANPEP P15144 1/20 0.35
ENPEP Q07075 1/20 0.35
PLG P00747 1/20 0.34
PLAT P00750 1/20 0.34
LMNA P02545 1/20 0.34
GRIK1 P39086 1/20 0.34
GRIK2 Q13002 1/20 0.34
GRM1 Q13255 1/20 0.34
GRM2 Q14416 1/20 0.34
ALOX15 P16050 1/20 0.34
HSD17B10 Q99714 1/20 0.34
SLC1A3 P43003 2/20 0.32
SLC1A2 P43004 2/20 0.32
SLC1A1 P43005 2/20 0.32
SLC6A1 P30531 2/20 0.32
GABRA5 P31644 2/20 0.32
GABRB2 P47870 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1134203 1.00
SCHEMBL410506 0.91 POLB (0.32) TET2TET3TET1ANPEPENPEP
SCHEMBL644021 0.90 KMT2A (0.42) TET2LMNASLC1A3SLC1A2SLC1A1
SCHEMBL1735458 0.90 KMT2A (0.38) TET2TET3TET1GRIK1GRIK2
SCHEMBL1052751 0.89 ALDH1A1 (0.34) TET2TET3TET1ANPEPENPEP
SCHEMBL1051356 0.89 TET2 (0.32) TET2TET3TET1ANPEPENPEP
SCHEMBL643110 0.88 EPHX1 (0.45) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL111091 0.88 EPHX1 (0.45) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL4610177 0.88 EPHX1 (0.45) LMNASLC1A3SLC1A2SLC1A1EPHX1
SCHEMBL10814953 0.88 EPHX1 (0.45) LMNASLC1A3SLC1A2SLC1A1EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1539852-B1 FAST DRYING COATINGS VOCFREE INC (US) 2007-05-30 EP claimed
US-8043899-B2 Photosensitive resin composition ASAHI KASEI E-MATERIALS CORPORATION (JP) 2011-10-25 US disclosed
US-20100123259-A1 PHOTOSENSITIVE RESIN COMPOSITION ASAHI KASEI E-MATERIALS CORPORATION (JP) 2010-05-20 US disclosed
US-20100019399-A1 POLYORGANOSILOXANE COMPOSITION ASAHI KASEI EMD CORPORATION (JP) 2010-01-28 US disclosed
US-5264125-A Cationic or anionic addition monomer with crosslinking monomer and a diluent for nonporous membranes IONICS' INCORPORATED (US) 1993-11-23 US disclosed
US-5145618-A Passing sandwich of support substrate and pliable foil with polymerizable liquid between rolls, separating solid polymer sheet IONICS, INCORPORATED (US) 1992-09-08 US disclosed
EP-0031593-B1 RADIATION-POLYMERIZABLE COMPOSITION AND RADIATION-SENSIBLE COPYING MATERIAL PRODUCED THEREWITH HOECHST AKTIENGESELLSCHAFT (DE) 1984-07-25 EP disclosed
EP-0031592-B1 PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOPOLYMERIZABLE COPYING MATERIAL PRODUCED THEREWITH HOECHST AKTIENGESELLSCHAFT (DE) 1983-12-07 EP disclosed
US-4327170-A Photopolymerizable unsaturated polyesters and copying material prepared therewith HOECHST AKTIENGESELLSCHAFT (DE) 1982-04-27 US disclosed
US-4322491-A BINDER, PHOTOINITIATOR, AND AN UNSATURATED COMPOUND HOECHST AKTIENGESELLSCHAFT (DE) 1982-03-30 US disclosed
EP-0031593-A1 Radiation-polymerizable composition and radiation-sensible copying material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1981-07-08 EP disclosed
EP-0031592-A1 Photopolymerizable composition and photopolymerizable copying material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1981-07-08 EP disclosed