SCHEMBL25370911

SCHEMBL25370911

CCO[Si](CCCc1ccco1)(OCC)OCC

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.42
▸ HPGD P15428 4/20 0.42
▸ CYP3A4 P08684 1/20 0.42
▸ ALOX15 P16050 1/20 0.42
▸ USP2 O75604 1/20 0.42
▸ TDP1 Q9NUW8 1/20 0.42
▸ MAPT P10636 5/20 0.39
▸ HTT P42858 3/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ HSD17B10 Q99714 3/20 0.37
▸ POLB P06746 2/20 0.37
▸ TP53 P04637 1/20 0.37
▸ MAPK1 P28482 1/20 0.36
▸ SMN1; SMN2 Q16637 3/20 0.36
▸ TSHR P16473 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ KDM4E B2RXH2 1/20 0.35
▸ RAB9A P51151 2/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2C9 P11712 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15842422 0.90 ALDH1A1 (0.39) ALDH1A1HPGDCYP3A4ALOX15USP2
SCHEMBL12079742 0.81 ALDH1A1 (0.40) ALDH1A1HPGDUSP2MAPTHTT
SCHEMBL29426616 0.76 EPHX2 (0.45) ALDH1A1HPGDTDP1MAPTHTT
SCHEMBL20982048 0.74 HTT (0.46) ALDH1A1HPGDMAPTHTTHSD17B10
SCHEMBL256700 0.74 — —
SCHEMBL336838 0.73 ALDH1A1 (0.44) ALDH1A1HPGDTDP1MAPTHTT
SCHEMBL20982064 0.73 ALDH1A1 (0.46) ALDH1A1HPGDTDP1MAPTHTT
SCHEMBL20982037 0.73 POLB (0.40) ALDH1A1CYP3A4TDP1MAPTNPSR1
SCHEMBL7094868 0.73 ALDH1A1 (0.67) ALDH1A1HPGDCYP3A4ALOX15USP2
SCHEMBL11060991 0.73 ALDH1A1 (0.61) ALDH1A1HPGDCYP3A4ALOX15USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118647935-A Composition for forming silicon-containing resist underlayer film having unsaturated bond and ring structure 日产化学株式会社 2024-09-13 — — CN disclosed
WO-2023157943-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UNSATURATED BOND AND CYCLIC STRUCTURE 日産化学株式会社 2023-08-24 — — WO disclosed
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