SCHEMBL25422998

SCHEMBL25422998

Oc1cc(O)cc(-c2c(F)c(O)c(O)c(F)c2F)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NQO1 P15559 1/20 0.48
▸ BACE1 P56817 1/20 0.38
▸ ABL1 P00519 4/20 0.37
▸ ABCB1 P08183 4/20 0.37
▸ BCR P11274 4/20 0.37
▸ CA12 O43570 1/20 0.36
▸ CA1 P00915 1/20 0.36
▸ CA9 Q16790 1/20 0.36
▸ ESR1 P03372 1/20 0.31
▸ ESR2 Q92731 1/20 0.31
▸ GAA P10253 1/20 0.31
▸ PTGS1 P23219 1/20 0.30
▸ NPC1 O15118 1/20 0.30
▸ TP53 P04637 1/20 0.30
▸ MAPK1 P28482 1/20 0.30
▸ CASP3 P42574 1/20 0.30
▸ RAB9A P51151 1/20 0.30
▸ SMN1; SMN2 Q16637 1/20 0.30
▸ SENP8 Q96LD8 1/20 0.30
▸ SENP7 Q9BQF6 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29319742 0.87 NQO1 (0.55) NQO1BACE1ABL1ABCB1BCR
SCHEMBL25422121 0.86 NQO1 (0.48) NQO1BACE1ABL1ABCB1BCR
SCHEMBL29319788 0.85 NQO1 (0.52) NQO1BACE1ABL1ABCB1BCR
SCHEMBL29319751 0.78 NQO1 (0.50) NQO1BACE1ABL1ABCB1BCR
SCHEMBL25419910 0.76 SENP1 (0.48) ABL1ABCB1BCRCA12CA1
SCHEMBL29319801 0.74 NQO1 (0.46) NQO1BACE1ABL1ABCB1BCR
SCHEMBL16982130 0.73 ESR1 (0.41) ESR1ESR2
SCHEMBL29319692 0.73 ALDH1A1 (0.50) NQO1CA12CA1CA9ESR1
SCHEMBL25419456 0.71 TAAR1 (0.33) CA12CA1CA9ESR1ESR2
SCHEMBL5948900 0.70 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 — — US disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 — — EP disclosed
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