SCHEMBL2544207

SCHEMBL2544207

CC=C(C)C(=O)OC(C)CC(C)O

nearest known ligand 0.31

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM1 P11229 1/20 0.31
TBXA2R P21731 1/20 0.31
CYP19A1 P11511 1/20 0.31
FAAH O00519 1/20 0.31
GALR3 O60755 1/20 0.31
MAPT P10636 1/20 0.31
BLM P54132 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10778425 0.84 TSHR (0.30) TSHR
SCHEMBL2540761 0.82 FAAH (0.37) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL9577209 0.81 CYP19A1 (0.33) CYP19A1
SCHEMBL1788551 0.79 FAAH (0.45) FAAHMAPT
SCHEMBL1355619 0.79 TSHR (0.33) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL4929743 0.79 TSHR (0.33) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL17088053 0.79 FAAH (0.36) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL4275495 0.78 TSHR (0.45) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL3751182 0.76 TSHR (0.52) TSHRCHRM2CHRM4CHRM1TBXA2R
SCHEMBL17472929 0.76 TSHR (0.36) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220386719-A1 DISPOSABLE VINYL ACETATE ETHYLENE GLOVE Twolink Sdn Bhd (MY) 2022-12-08 US claimed
US-8044138-B2 Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEM, LTD. (KR) 2011-10-25 US claimed
CN-101747542-A Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEMICAL LTD 2010-06-23 CN claimed
US-20100152365-A1 CARBOXYLIC ACID-MODIFIED NITRILE COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP FORMING COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-06-17 US claimed
US-6403281-B1 ALKYLENE GLYCOL DI(METH)ACRYLATE OR ALKYLENE GLYCOL DI(2-NORBORNENE-5-CARBOXYLATE) CROSSLINKING MONOMERS; DURABILITY, CONTRAST, RESOLUTION, ADHESION; PHOTOLITHOGRAPHY; SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-11 US claimed
US-20220386719-A1 DISPOSABLE VINYL ACETATE ETHYLENE GLOVE Twolink Sdn Bhd (MY) 2022-12-08 US disclosed
US-8044138-B2 Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEM, LTD. (KR) 2011-10-25 US disclosed
CN-101747542-A Carboxylic acid-modified nitrile copolymer latex and latex composition for dip forming comprising the same LG CHEMICAL LTD 2010-06-23 CN disclosed
US-20100152365-A1 CARBOXYLIC ACID-MODIFIED NITRILE COPOLYMER LATEX AND LATEX COMPOSITION FOR DIP FORMING COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-06-17 US disclosed
US-7608659-B2 Conductive material mixed composition ADEKA CORPORATION (JP) 2009-10-27 US disclosed
US-20090072204-A1 CONDUCTIVE MATERIAL MIXED COMPOSITION ADEKA CORPORATION (JP) 2009-03-19 US disclosed
US-20070191534-A1 Conductive material mixed composition ADEKA CORPORATION (JP) 2007-08-16 US disclosed
CN-1217232-C Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same HYUNDAI ELECTRONICS IND (JP) 2005-08-31 CN disclosed
US-6403281-B1 ALKYLENE GLYCOL DI(METH)ACRYLATE OR ALKYLENE GLYCOL DI(2-NORBORNENE-5-CARBOXYLATE) CROSSLINKING MONOMERS; DURABILITY, CONTRAST, RESOLUTION, ADHESION; PHOTOLITHOGRAPHY; SEMICONDUCTORS HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2002-06-11 US disclosed
CN-1285529-A Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same HYUNDAI ELECTRONICS IND (JP) 2001-02-28 CN disclosed