Sulfuric Acid

Sulfuric Acid

SCHEMBL2545783

CCN(CC)[Ti](N(CC)CC)(N(CC)CC)N(CC)CC.O=S(=O)([O-])[O-].O=S(=O)([O-])[O-].[Ti+4]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL28311890 0.67 MEN1 (0.35)
Sulfuric Acid SCHEMBL10930564 0.67 SIGMAR1 (0.32)
Sulfuric Acid SCHEMBL28279557 0.67 SIGMAR1 (0.32)
Sulfuric Acid SCHEMBL28129036 0.65 TP53 (0.50)
Sulfuric Acid SCHEMBL28872867 0.64
Sulfuric Acid SCHEMBL30490011 0.64 TSHR (0.43)
Sulfuric Acid SCHEMBL28281552 0.64 TSHR (0.43)
Sulfuric Acid SCHEMBL34287 0.62 MEN1 (0.46)
Sulfuric Acid SCHEMBL1931328 0.62 MEN1 (0.46)
Sulfuric Acid SCHEMBL11442406 0.61 TP53 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8043535-B2 Enables to form a circuit or the like having good adhesion to a substrate and to form a conductor having high film density and low electric resistance; accurate and fine wiring and electrode by adopting a dispenser coating method and an inkjet printing MITSUI MINING & SMELTING CO., LTD. (JP) 2011-10-25 US disclosed