Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | PCNA | P12004 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.31 |
| ▸ | GRM4 | Q14833 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22097561 | 0.93 | PCNA (0.32) | LMNAGLAMEN1PKMKMT2A | |
| SCHEMBL22097570 | 0.78 | PCNA (0.32) | PCNASCN9APOLB | |
| SCHEMBL22097556 | 0.74 | ACACB (0.36) | KMT2APCNAGAASCN9ASMN1; SMN2 | |
| SCHEMBL19678524 | 0.70 | GRM4 (0.38) | LMNANPSR1MEN1KMT2AGAA | |
| SCHEMBL19846335 | 0.67 | TP53 (0.32) | — | |
| SCHEMBL21705617 | 0.66 | POLB (0.31) | POLB | |
| SCHEMBL26343839 | 0.65 | PCNA (0.39) | PCNAPOLB | |
| SCHEMBL12013039 | 0.64 | TPMT (0.36) | LMNAMEN1KMT2AGAAPOLB | |
| SCHEMBL14136180 | 0.63 | LMNA (0.43) | LMNAGAAPOLB | |
| SCHEMBL22097488 | 0.62 | PCNA (0.38) | PCNAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |