SCHEMBL25476227

SCHEMBL25476227

CC(=O)N(C)c1c(C)c(C(=O)OCCS(=O)(=O)O)c(C)c(N(C)C(C)=O)c1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25476226 0.88 — —
SCHEMBL19756077 0.81 LMNA (0.30) —
SCHEMBL25476223 0.81 KMT2A (0.36) —
SCHEMBL25527961 0.79 — —
SCHEMBL25476216 0.75 CYP3A4 (0.36) —
SCHEMBL19756065 0.73 LMNA (0.45) —
SCHEMBL25737075 0.72 — —
SCHEMBL25476221 0.69 SMN1; SMN2 (0.39) —
SCHEMBL19756104 0.68 ALDH1A1 (0.39) —
SCHEMBL18775829 0.67 CA1 (0.49) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
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