Acrylic Acid Ethyl Ester

Acrylic Acid Ethyl Ester

SCHEMBL2548085

C=CC(=O)OCC.C=CCN

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.50
HPGD P15428 1/20 0.50
ALDH1A1 P00352 8/20 0.45
TP53 P04637 3/20 0.45
HIF1A Q16665 3/20 0.45
CYP3A4 P08684 2/20 0.45
HSD17B10 Q99714 2/20 0.45
HCAR2 Q8TDS4 1/20 0.43
NPSR1 Q6W5P4 1/20 0.42
THRB P10828 1/20 0.42
ALOX15 P16050 1/20 0.41
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CYP1A2 P05177 1/20 0.38
LMNA P02545 1/20 0.37
MAPT P10636 1/20 0.36
MGAM O43451 1/20 0.36
GAA P10253 1/20 0.36
SI P14410 1/20 0.36
MGAM2 Q2M2H8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid Ethyl Ester SCHEMBL4377433 0.91 TSHR (0.54) TSHRHPGDALDH1A1TP53HIF1A
Acrylic Acid Ethyl Ester SCHEMBL28234481 0.89 TSHR (0.57) TSHRHPGDALDH1A1TP53HIF1A
Acrylic Acid Ethyl Ester SCHEMBL5576400 0.89 TSHR (0.52) TSHRHPGDALDH1A1TP53HIF1A
Acrylic Acid Ethyl Ester SCHEMBL202495 0.89
Acrylic Acid Ethyl Ester SCHEMBL5831496 0.89 TSHR (0.56) TSHRHPGDALDH1A1TP53HIF1A
Acrylic Acid Ethyl Ester SCHEMBL9557413 0.89 TSHR (0.60) TSHRHPGDALDH1A1TP53HIF1A
Acrylic Acid Ethyl Ester SCHEMBL8159679 0.89 TSHR (0.60) TSHRHPGDALDH1A1TP53HIF1A
Acrylic Acid Ethyl Ester SCHEMBL3180 0.89
Acrylic Acid Ethyl Ester SCHEMBL3280684 0.87 TSHR (0.55) TSHRHPGDALDH1A1TP53HIF1A
Acrylic Acid Ethyl Ester SCHEMBL31612430 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112368108-B Adhesive tape for glass processing 古河电气工业株式会社 2022-11-04 CN disclosed
CN-112368106-B Adhesive tape for glass processing 古河电气工业株式会社 2022-11-01 CN disclosed
CN-111742026-B Ultraviolet-curable adhesive tape for semiconductor wafer processing, method for producing semiconductor chip, and method for using the tape 古河电气工业株式会社 2022-05-24 CN disclosed
CN-114364761-A Adhesive tape for semiconductor processing 古河电气工业株式会社 2022-04-15 CN disclosed
CN-107112222-B Wafer fixing tape, semiconductor wafer processing method and semiconductor chip 古河电气工业株式会社 2021-03-16 CN disclosed
CN-112368107-A Adhesive tape for glass processing 古河电气工业株式会社 2021-02-12 CN disclosed
CN-112368106-A Adhesive tape for glass processing 古河电气工业株式会社 2021-02-12 CN disclosed
CN-112368108-A Adhesive tape for glass processing 古河电气工业株式会社 2021-02-12 CN disclosed
CN-112351859-A Adhesive tape for glass processing 古河电气工业株式会社 2021-02-09 CN disclosed
EP-1775760-B1 WAFER PROCESSING TAPE FURUKAWA ELECTRIC CO LTD (JP) 2021-01-20 EP disclosed
US-20060204749-A1 Wafer-processing tape THE FURUKAWA ELECTRIC CO., LTD. 2006-09-14 US disclosed
US-7081503-B2 Process producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition KANEKA CORPORATION (JP) 2006-07-25 US disclosed
US-7009004-B2 Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition KANEKA CORPORATION (JP) 2006-03-07 US disclosed
US-20060004171-A1 Process for producing vinyl polymer having alkenyl group at end, vinyl polymer, and curable composition TSUJI RYOTARO 2006-01-05 US disclosed
US-20050249909-A1 Wafer-adhering adhesive tape THE FURUKAWA ELECTRIC CO., LTD. 2005-11-10 US disclosed
EP-1591504-A1 PRESSURE-SENSITIVE ADHESIVE TAPE FOR PASTING WAFER THERETO The Furukawa Electric Co., Ltd. (JP) 2005-11-02 EP disclosed
US-20050004318-A1 Curable composition OHSHIRO NOBUAKI (JP) 2005-01-06 US disclosed
EP-1452550-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2004-09-01 EP disclosed
US-20040097678-A1 Process for producing vinyl polymer having alkenyl group at end vinyl polymer and curable composition KANEKA CORPORATION (JP) 2004-05-20 US disclosed
EP-1375531-A1 PROCESS FOR PRODUCING VINYL POLYMER HAVING ALKENYL GROUP AT END, VINYL POLYMER, AND CURABLE COMPOSITION KANEKA CORPORATION (JP) 2004-01-02 EP disclosed