SCHEMBL25509596

SCHEMBL25509596

C=C(C)C(=O)OC1C=CC(C(=O)O)CC1

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32
ELANE P08246 1/20 0.31
POLB P06746 1/20 0.31
APEX1 P27695 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15845054 0.74 MAPT (0.36) ALDH1A1
SCHEMBL9232648 0.71 ALDH1A1 (0.33) ALDH1A1
SCHEMBL28808648 0.71 ALDH1A1 (0.39) ALDH1A1
SCHEMBL638769 0.71 POLB (0.46) POLBAPEX1TDP1
SCHEMBL25916380 0.70 ALDH1A1 (0.35) ALDH1A1
SCHEMBL942938 0.67 CA12 (0.42) ALDH1A1POLBAPEX1TDP1
SCHEMBL8354298 0.67 CA12 (0.42) ALDH1A1POLBAPEX1TDP1
SCHEMBL24506979 0.66 MIF (0.36) ALDH1A1
SCHEMBL6536654 0.66 ALDH1A1 (0.34) ALDH1A1
SCHEMBL25278 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152693-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-18 US disclosed
US-20230152693-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-18 US disclosed