Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28808648 | 0.85 | ALDH1A1 (0.39) | ALDH1A1 | |
| SCHEMBL9578287 | 0.81 | CA12 (0.37) | — | |
| SCHEMBL14624754 | 0.81 | CA12 (0.37) | — | |
| SCHEMBL30688690 | 0.77 | — | — | |
| SCHEMBL14533714 | 0.76 | GPR84 (0.32) | — | |
| SCHEMBL28512304 | 0.76 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL5185884 | 0.75 | — | — | |
| SCHEMBL22610216 | 0.73 | — | — | |
| SCHEMBL27856401 | 0.73 | CHRM2 (0.32) | — | |
| SCHEMBL15845054 | 0.73 | MAPT (0.36) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6818377-B2 | ACID GENERATOR; RESIN CONTAINING A POLYALICYCLIC GROUP OR A FURANONE, CYCLOPENTANONE, PYRROLIDONE OR TETRAHYDROTHIOPHENONE GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-16 | — | — | US | disclosed |
| US-20040161697-A2 | Positive Photosensitive Composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-19 | — | — | US | disclosed |
| EP-0877293-B1 | Positive photosensitive composition | FUJI PHOTO FILM CO LTD (JP) | 2004-01-14 | — | — | EP | disclosed |
| US-20030044718-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-03-06 | — | — | US | disclosed |
| US-6517991-B1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-11 | — | — | US | disclosed |
| US-6479209-B1 | POSITIVE PHOTOSENSITIVE COMPOSITION SUITABLY USED WHEN THE EXPOSURE LIGHT SOURCE USED IS A FAR ULTRAVIOLET BEAM OF 250 NM OR LESS | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-12 | — | — | US | disclosed |
| EP-0878738-B1 | Positive resist composition | FUJI PHOTO FILM CO LTD (JP) | 2002-01-09 | — | — | EP | disclosed |
| US-6291130-B1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-09-18 | — | — | US | disclosed |
| US-6245485-B1 | MIXTURE OF ACID GENERATOR AND A CROSSLINKED ADDITION POLYMER COMPRISING UNITS HAVING A POLYCYCLIC ALICYCLIC MOIETY AND A CARBOXYL MOIETY; SMALL ABSORPTION OF THE FAR ULTRAVIOLET LIGHT WAVELENGTHS AND IMPROVED DRY ETCH RESISTANCE | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| EP-0878738-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-18 | — | — | EP | disclosed |
| EP-0877293-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-11 | — | — | EP | disclosed |