SCHEMBL25526431

SCHEMBL25526431

CC(C)B(OB(OC(C)(C)C)C(C)C)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4258206 0.69
SCHEMBL12675478 0.59
SCHEMBL196117 0.58 ALDH1A1 (0.36)
SCHEMBL12319889 0.57
SCHEMBL4261562 0.57
SCHEMBL2078957 0.56 ALDH1A1 (0.33)
Fluoride SCHEMBL15367056 0.56 ALDH1A1 (0.33)
SCHEMBL9387756 0.56 ALDH1A1 (0.33)
SCHEMBL14816959 0.56 ALDH1A1 (0.33)
SCHEMBL5732640 0.56 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230151159-A1 COMPOUND FOR FORMING HARDMASK, HARDMASK COMPOSITION INCLUDING THE COMPOUND, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE HARDMASK COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-05-18 US disclosed