Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACE | P12821 | 2/20 | 0.46 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.38 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.36 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.36 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.36 |
| ▸ | ANPEP | P15144 | 1/20 | 0.35 |
| ▸ | ENPEP | Q07075 | 1/20 | 0.35 |
| ▸ | DGKA | P23743 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | FNTA | P49354 | 1/20 | 0.35 |
| ▸ | FNTB | P49356 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.33 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527239 | 0.86 | FOLH1 (0.50) | ACEFOLH1BLMLMNAENPEP | |
| SCHEMBL8996642 | 0.85 | ADRA2A (0.50) | ADRA2AADRA1ATDP1MAPTBLM | |
| SCHEMBL98980 | 0.85 | DGKA (0.46) | ACEFOLH1ADRA2AADRA1ATDP1 | |
| SCHEMBL25527413 | 0.83 | TSHR (0.40) | ACEFOLH1ADRA2AADRA1ATDP1 | |
| SCHEMBL16255470 | 0.83 | FOLH1 (0.52) | ACEFOLH1TDP1MAPTLMNA | |
| SCHEMBL3517702 | 0.82 | — | — | |
| SCHEMBL11357571 | 0.81 | ACE (0.46) | ACEFOLH1ADRA2AADRA1ATDP1 | |
| SCHEMBL99058 | 0.80 | DGKA (0.43) | ACEFOLH1ADRA2AADRA1ATDP1 | |
| SCHEMBL28466792 | 0.80 | FNTA (0.44) | ACEADRA2AADRA1ATDP1MAPT | |
| SCHEMBL30309890 | 0.80 | ADRA2A (0.46) | ACEADRA2AADRA1ATDP1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |