⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25946784 | 0.86 | POLB (0.30) | — | |
| SCHEMBL22374241 | 0.85 | — | — | |
| SCHEMBL20872111 | 0.73 | — | — | |
| SCHEMBL25527236 | 0.72 | — | — | |
| SCHEMBL26457301 | 0.68 | ALDH1A1 (0.37) | — | |
| SCHEMBL20872290 | 0.68 | — | — | |
| SCHEMBL21208319 | 0.67 | — | — | |
| SCHEMBL26457309 | 0.67 | — | — | |
| SCHEMBL7011176 | 0.66 | — | — | |
| SCHEMBL15134138 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |