SCHEMBL26457301

SCHEMBL26457301

COC(=O)C1C2CC3C(OS(=O)(=O)C31)C2OC(=O)CN1CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.37
▸ MEN1 O00255 2/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ TDP1 Q9NUW8 1/20 0.33
▸ LMNA P02545 1/20 0.31
▸ MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26457307 0.85 MEN1 (0.32) ALDH1A1MEN1KMT2A
SCHEMBL26475522 0.85 MEN1 (0.35) ALDH1A1MEN1KMT2A
SCHEMBL26475523 0.84 MEN1 (0.36) ALDH1A1MEN1KMT2A
SCHEMBL26475506 0.84 MEN1 (0.32) ALDH1A1MEN1KMT2A
SCHEMBL26457309 0.80 — —
SCHEMBL26457350 0.78 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ATDP1
SCHEMBL26457127 0.78 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ATDP1LMNA
SCHEMBL26475507 0.78 — —
SCHEMBL12764582 0.77 — —
SCHEMBL7012782 0.77 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230137472-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 — — US disclosed
US-20230137472-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 — — US disclosed
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